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Title
Room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition
Article in journal
Authors
X. Y. Qiu, Q. M. Liu, Feng Gao, L. Y. Lu, J. -M. Liu
Publication Year
2006
Source
Applied Physics Letters, 2006, (89)24, 242504
Link to Source (DOI)
10.1063/1.2405883
Abstract
<p>The room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition on various substrates in oxygen-defective ambient is demonstrated. The magnetization is independent of film thickness, but depends on substrates and deposition temperatures. A magnetic moment of similar to 0.26 mu(B) per HfAlOx f.u. is recorded for HfAlOx films deposited under optimized conditions [deposited at 600 degrees C on (001) sapphire in high vacuum]. It is argued that interfacial defects are one of the possible sources of the weak ferromagnetism. (c) 2006 American Institute of Physics.</p>