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| Authors: | A. Kerlain: Thales Research and Technology, Sweden |
| | E. Morvan: Thales Research and Technology, Sweden |
| | C. Dua: Thales Research and Technology, Sweden |
| | N. Caillas: Thales Research and Technology, Sweden |
| | C. Brylinski: Thales Research and Technology, Sweden |
| Publication title: | Recent Results from SiC Research Project at Thales: Effect of Passivation on Device Stability and Gate Reverse Characteristics on 4H-SIC Mesfets |
| Conference: | GigaHertz 2003. Proceedings from the Seventh Symposium |
| Publication type: | Abstract and Fulltext |
| Issue: | 008 |
| Article No.: | 002 |
| Abstract: | Several passivation schemes on 4H-SiC MESFETs have been studied. Two main configurations are compared. MESFET structures with thin passivation layer or no passivation layer (Configuration 1) exhibit high breakdown voltage but also current instability after high voltage Vds stress. Thick SiO2 passivation covering the gate (Configuration 2) improves the current stability but yields lower breakdown voltage and higher gate leakage current. Surface trapping effects are considered as the main cause of the observed phenomena. |
| Language: | English |
| Year: | 2003 |
| No. of pages: | 4 |
| Series: | Linköping Electronic Conference Proceedings |
| ISSN (print): | 1650-3686 |
| ISSN (online): | 1650-3740 |
| File: | http://www.ep.liu.se/ecp/008/002/ecp00802.pdf |
| Available: | 2003-11-06 |
| Publisher: | Linköping University Electronic Press, Linköpings universitet |
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REFERENCE TO THIS PAGE | A. Kerlain, E. Morvan, C. Dua, N. Caillas, C. Brylinski (2003). Recent Results from SiC Research Project at Thales: Effect of Passivation on Device Stability and Gate Reverse Characteristics on 4H-SIC Mesfets, GigaHertz 2003. Proceedings from the Seventh Symposium http://www.ep.liu.se/ecp_article/index.en.aspx?issue=008;article=002 (accessed 5/23/2013) |
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