Thin Film PhysicsIntroduction

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Fulltext Publication Portfolio

192 publications from 2005 to 2013
Mentioned in social media 470 times*

Journal Articles

Martin Magnuson, Erik Lewin, Lars Hultman and Ulf Jansson

Electronic structure and chemical bonding of nanocrystalline-TiC/amorphous-C nanocomposites
Physical Review B. Condensed Matter and Materials Physics, 2009, 80( 235108).

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Web of Science® Times Cited: 10

Gueorgui Kostov Gueorguiev, E Broitman, Andrej Furlan, Sven Stafström and Lars Hultman

Dangling bond energetics in carbon nitride and phosphorus carbide thin films with fullerene-like and amorphous structure
CHEMICAL PHYSICS LETTERS, 2009, 482( 1-3), 110-113.

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Web of Science® Times Cited: 7

Björn Alling, Magnus Odén, Lars Hultman and Igor Abrikosov

Pressure enhancement of the isostructural cubic decomposition in Ti_1−xAl_xN
Applied Physics Letters, 2009, 95( 181906).

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Web of Science® Times Cited: 13

Martin Magnuson, M. Mattesini, Carina Höglund, Jens Birch and Lars Hultman

Electronic structure and chemical bonding anisotropy investigation of wurtzite AlN
Physical Review B. Condensed Matter and Materials Physics, 2009, 80, 155105.

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Web of Science® Times Cited: 6

Y Sun, S Johnsen, Per Eklund, M Sillassen, J Bottiger, N Oeschler, P Sun, F Steglich and B B Iversen

Thermoelectric transport properties of highly oriented FeSb2 thin films
JOURNAL OF APPLIED PHYSICS, 2009, 106( 3).

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Web of Science® Times Cited: 15

Torun Berlind, Andrej Furland, Zs. Czigany, Jörg Neidhardt, Lars Hultman and Hans Arwin

Spectroscopic ellipsometry characterization of amorphous carbon and amorphous,graphitic and fullerene-like carbon nitride thin films
Thin Solid Films, 2009, 517( 24), 6652-6658.

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Web of Science® Times Cited: 3

Carina Höglund, Javier Bareno, Jens Birch, Björn Alling, Zsolt Czigany and Lars Hultman

Cubic Sc1-xAlxN solid solution thin films deposited by reactive magnetron sputter epitaxy onto ScN(111)
JOURNAL OF APPLIED PHYSICS, 2009, 105( 11), 132862.

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Web of Science® Times Cited: 6

Axel Flink, R M Saoubi, Finn Giuliani, J Sjolen, T Larsson, Per Persson, M P Johansson and Lars Hultman

Microstructural characterization of the tool-chip interface enabled by focused ion beam and analytical electron microscopy
WEAR, 2009, 266( 11-12), 1237-1240.

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Web of Science® Times Cited: 1

Erik Wallin, Peter Münger, Valeriu Chirita and Ulf Helmersson

Low-temperature alpha-alumina thin film growth: ab initio studies of Al adatom surface migration
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42( 12), 125302.

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Web of Science® Times Cited: 5

Arkady Mikhaylushkin, Carina Höglund, Jens Birch, Zs Czigany, Lars Hultman, Sergey Simak, Björn Alling, Ferenc Tasnadi and Igor Abrikosov

Stability of the ternary perovskites Sc₃EN (E=B,Al,Ga,In) from first principles
PHYSICAL REVIEW B, 2009, 79( 13), 134107.

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Web of Science® Times Cited: 7

M. Sillassen, Per Eklund, M. Sridharan, N. Pryds, N. Bonanos and J. Bottiger

Ionic conductivity and thermal stability of magnetron-sputtered nanocrystalline yttria-stabilized zirconia
Journal of Applied Physics, 2009, 105( 10), 104907.

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Web of Science® Times Cited: 11

Maurizio Mattesini, Martin Magnuson, Ferenc Tasnádi, Carina Höglund, Igor A. Abrikosov and Lars Hultman

Elastic properties and electrostructural correlations in ternary scandium-based cubic inverse perovskites: A first-principles study
Physical Review B. Condensed Matter and Materials Physics, 2009, 79( 125122).

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Web of Science® Times Cited: 23

Vanya Darakchieva, T Hofmann, M Schubert, Bo Sernelius, Bo Monemar, Per Persson, Finn Giuliani, E Alves, H Lu and W J Schaff

Free electron behavior in InN: On the role of dislocations and surface electron accumulation
Applied Physics Letters, 2009, 94( 2), 022109.

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Web of Science® Times Cited: 19

Ph.D. Theses

Fullerene-like CN_x and CP_x Thin Films; Synthesis, Modeling, and Applications
2009.

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Licentiate Theses

Carina Höglund

Reactive Magnetron Sputter Deposition and Characterization of Thin Films from the Ti-Al-N and Sc-Al-N Systems
2009.

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Student Theses

Gustav Edman Jönsson, Hans Högberg and Lars Hultman

Sputtring av Ti-Si-C-Ag beläggningar från sammansatta sputterkällor
1181, 2009.

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*Social media data based on publications from 2011 to present and with a DOI; data delivered by Altmetric.com.
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Org.nr: 202100-3096
VAT nr: SE202100-309601
Postgiro: 18 34 15-9