Publications for Ulf Helmersson
Co-author map based on ISI articles 2007-

Keywords

temperatures temperature substrates sputtering sputtered reactive pulsed pulse power plasma metal magnetron ionization ion impulse hipims film discharge deposited (hipims)

Journal Articles

Asim Aijaz, Kostas Sarakinos, Mohsin Raza, Jens Jensen and Ulf Helmersson
  Principles for designing sputtering-based strategies for high-rate synthesis of dense and hard hydrogenated amorphous carbon thin films
  Diamond and related materials, 2014, 44, 117-122.

Steffen Sønderby, Asim Aijaz, Ulf Helmersson, Kostas Sarakinos and Per Eklund
  Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering
  Surface & Coatings Technology, 2014, 240, 1-6.
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Iris Pilch, Daniel Söderström, M I Hasan, Ulf Helmersson and N Brenning
  Fast growth of nanoparticles in a hollow cathode plasma through orbit motion limited ion collection
  Applied Physics Letters, 2013, 103(19), 193108.
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Mohammad Hasan, Iris Pilch, Daniel Söderström, D. Lundin, Ulf Helmersson and N. Brenning
  Modeling the extraction of sputtered metal from high power impulse hollow cathode discharges
  Plasma sources science & technology (Print), 2013, 22(3), 035006.
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 Web of Science® Times Cited: 2

Daniel Magnfält, Viktor Elofsson, G Abadias, Ulf Helmersson and Kostas Sarakinos
  Time-domain and energetic bombardment effects on the nucleation and coalescence of thin metal films on amorphous substrates
  Journal of Physics D: Applied Physics, 2013, 46(21), .
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 Web of Science® Times Cited: 4

Montri Aiempanakit, Asim Aijaz, Daniel Lundin, Ulf Helmersson and Tomas Kubart
  Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
  Journal of Applied Physics, 2013, 113(13), .
 Web of Science® Times Cited: 5

Iris Pilch, Daniel Söderström, N Brenning and Ulf Helmersson
  Size-controlled growth of nanoparticles in a highly ionized pulsed plasma
  Applied Physics Letters, 2013, 102(3), .
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 Web of Science® Times Cited: 5

Asim Aijaz, Kostas Sarakinos, Daniel Lundin, Nils Brenning and Ulf Helmersson
  A strategy for increased carbon ionization in magnetron sputtering discharges
  Diamond and related materials, 2012, 23, 1-4.
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 Web of Science® Times Cited: 15

Mattias Samuelsson, Jens Jensen, Ulf Helmersson, Lars Hultman and Hans Högberg
  ZrB2 thin films grown by high power impulse magnetron sputtering (HiPIMS) from a compound target
  Thin Solid Films, 2012, 526, 163-167.
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 Web of Science® Times Cited: 4

N Brenning, C Huo, Daniel Lundin, M A Raadu, C Vitelaru, G D Stancu, T Minea and Ulf Helmersson
  Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
  Plasma sources science & technology (Print), 2012, 21(2), 025005.
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 Web of Science® Times Cited: 18

Mattias Samuelsson, Kostas Sarakinos, Hans Högberg, Erik Lewin, Ulf Jansson, Bengt Wälivaara, Henrik Ljungcrantz and Ulf Helmersson
  Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
  Surface & Coatings Technology, 2012, 206(8-9), 2396-2402.
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 Web of Science® Times Cited: 7

Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Bjorefors, Bengt Walivaara, Henrik Ljungcrantz and Ulf Helmersson
  Influence of ionization degree on film properties when using high power impulse magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(3), 031507.
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 Web of Science® Times Cited: 6

J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson
  High power impulse magnetron sputtering discharge
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(030801), .
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 Web of Science® Times Cited: 72

Junaid Muhammad, Daniel Lundin, Justinas Palisaitis, Ching-Lien Hsiao, Vanya Darakchieva, Jens Jensen, Per Persson, Per Sandström, W-J Lai, L-C Chen, K-H Chen, Ulf Helmersson, Lars Hultman and Jens Birch
  Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering
  Journal of Applied Physics, 2011, 110(12), 123519.
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 Web of Science® Times Cited: 7

T Kubart, Montri Aiempanakit, J Andersson, T Nyberg, S Berg and Ulf Helmersson
  Studies of hysteresis effect in reactive HiPIMS deposition of oxides
  Surface & Coatings Technology, 2011, 205, S303-S306.
 Web of Science® Times Cited: 12

Montri Aiempanakit, Ulf Helmersson, Asim Aijaz, Petter Larsson, Roger Magnusson, Jens Jensen and Tomas Kubart
  Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
  Surface & Coatings Technology, 2011, 205(20), 4828-4831.
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 Web of Science® Times Cited: 20

Daniel Lundin, Seham Al Sahab, Nils Brenning, Chunqing Huo and Ulf Helmersson
  Internal current measurements in high power impulse magnetron sputtering
  Plasma sources science & technology (Print), 2011, 20(4), 045003.
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 Web of Science® Times Cited: 14

Montri Aiempanakit, Tomas Kubart, Petter Larsson, Kostas Sarakinos, Jens Jensen and Ulf Helmersson
  Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
  Thin Solid Films, 2011, 519(22), 7779-7784.
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 Web of Science® Times Cited: 11

Marcus Ekholm, Petter Larsson, Björn Alling, Ulf Helmersson and Igor Abrikosov
  Ab initio calculations and synthesis of the off-stoichiometric half-Heusler phase Ni1-xMn1+xSb
  JOURNAL OF APPLIED PHYSICS, 2010, 108(9), .
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 Web of Science® Times Cited: 3

Mattias Samuelsson, Daniel Lundin, Jens Jensen, Michael A Raadu, Jon Tomas Gudmundsson and Ulf Helmersson
  On the film density using high power impulse magnetron sputtering
  Surface & Coatings Technology, 2010, 205(2), 591-596.
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 Web of Science® Times Cited: 49

Michael Sillassen, Per Eklund, Nini Pryds, Erik Johnson, Ulf Helmersson and Jorgen Bottiger
  Low-Temperature Superionic Conductivity in Strained Yttria-Stabilized Zirconia
  ADVANCED FUNCTIONAL MATERIALS, 2010, 20(13), 2071-2076.
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 Web of Science® Times Cited: 38

Asim Aijaz, Daniel Lundin, Petter Larsson and Ulf Helmersson
  Dual-magnetron open field sputtering system for sideways deposition of thin films
  SURFACE and COATINGS TECHNOLOGY, 2010, 204(14), 2165-2169.
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 Web of Science® Times Cited: 9

Martina Lattemann, Ulf Helmersson and J.E. Greene
  Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias
  Thin Solid Films, 2010, 518(21), 5978-5980.
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 Web of Science® Times Cited: 29

N Brenning, R L Merlino, Daniel Lundin, M A Raadu and Ulf Helmersson
  Faster-than-Bohm Cross-B Electron Transport in Strongly Pulsed Plasmas
  PHYSICAL REVIEW LETTERS, 2009, 103(22), .
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 Web of Science® Times Cited: 19

Daniel Lundin, Nils Brenning, Daniel Jädernäs, Petter Larsson, Erik Wallin, Martina Lattemann, Michael A Raadu and Ulf Helmersson
  Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
  PLASMA SOURCES SCIENCE and TECHNOLOGY, 2009, 18(4), 045008.
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 Web of Science® Times Cited: 31

Daniel Lundin, Marc Stahl, Holger Kersten and Ulf Helmersson
  Energy flux measurements in high power impulse magnetron sputtering
  JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42(18), 185202.
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 Web of Science® Times Cited: 24

J T Gudmundsson, P. Sigurjonsson, Petter Larsson, Daniel Lundin and Ulf Helmersson
  On the electron energy in the high power impulse magnetron sputtering discharge
  JOURNAL OF APPLIED PHYSICS, 2009, 105(12), .
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 Web of Science® Times Cited: 27

Erik Wallin, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Low-temperature alpha-alumina thin film growth: ab initio studies of Al adatom surface migration
  JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42(12), 125302.
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 Web of Science® Times Cited: 6

T.I. Selinder, E. Coronel, Erik Wallin and Ulf Helmersson
  α-alumina coatings on WC/Co substrates by physical vapor deposition
  International journal of refractory metals & hard materials, 2009, 27(2), 507-512.
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 Web of Science® Times Cited: 13

Erik Wallin and Ulf Helmersson
  Hysteresis-free reactive high power impulse magnetron sputtering
  Thin Solid Films, 2008, 516(18), 6398-6401.
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 Web of Science® Times Cited: 37

Nils Brenning, I Axnas, M. A. Raadu, Daniel Lundin and Ulf Helmersson
  A bulk plasma model for dc and HiPIMS magnetrons
  PLASMA SOURCES SCIENCE and TECHNOLOGY, 2008, 17(4), 045009.
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 Web of Science® Times Cited: 24

Erik Wallin, T. I. Selinder, M. Elfwing and Ulf Helmersson
  Synthesis of α-Al2O3 thin films using reactive high power impulse magnetron sputtering
  Europhysics letters, 2008, 82(3), 36002.
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 Web of Science® Times Cited: 32

Erik Wallin, Jon Martin Andersson, Martina Lattemann and Ulf Helmersson
  Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films
  Thin Solid Films, 2008, 516(12), 3877-3883.
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 Web of Science® Times Cited: 18

Daniel Lundin, Ulf Helmersson, Scott Kirkpatrick, Suzanne Rohde and Nils Brenning
  Anomalous electron transport in high power impulse magnetron sputtering
  Plasma Sources Science and Technology, 2008, 17(2), 025007.
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 Web of Science® Times Cited: 37

Daniel Lundin, Petter Larsson, Erik Wallin, Martina Lattemann, Nils Brenning and Ulf Helmersson
  Cross-field ion transport during high power impulse magnetron sputtering
  Plasma Sources Science and Technology, 2008, 17(035021), .
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 Web of Science® Times Cited: 62

Jones Alami, Per Eklund, Jon M. Andersson, Martina Lattemann, Erik Wallin, Johan Böhlmark, Per Persson and Ulf Helmersson
  Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
  Thin Solid Films, 2007, 515(7-8), 3434-3438.
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 Web of Science® Times Cited: 42

Martina Lattemann, A.P. Ehiasarian, Johan Böhlmark, Per .Å.O. Persson and Ulf Helmersson
  Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel
  Surface & Coatings Technology, 2006, 200(22-23), 6495-6499.
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 Web of Science® Times Cited: 46

Ulf Helmersson, Martina Lattemann, Jones Alami, Johan Böhlmark, A.P. Ehiasarian and J.T. Gudmundsson
  Highly Ionized Sputter Discharges for Thin Film Fabrication
  Bulletin of the Russian Academy of Sciences. Physics, 2006, 70(8), 1421-1424.

L. Stuchlikova, D. Buc, L. Harmatha, Ulf Helmersson, W.H. Chang and I. Bello
  Deep energy levels in RuO2/4H-SiC Schottky barrier structures
  Applied Physics Letters, 2006, 88, 153509.
 Web of Science® Times Cited: 3

D. Buc, L. Stuchlikova, Ulf Helmersson, W.H. Chang and I. Bello
  Investigation of RuO2/4H-SiC Schottky diode contacts by deep level transient spectroscopy
  Chemical Physics Letters, 2006, 429(4-6), 617-621.
 Web of Science® Times Cited: 3

Erik Wallin, Jon Martin Andersson, E. Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of Al, O, and O2 adsorption on α-Al2O3 (0001) surfaces
  Physical Review B. Condensed Matter and Materials Physics, 2006, 74(12), 125409-1-125409-9.
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 Web of Science® Times Cited: 20

Ulf Helmersson, Martina Lattemann, Johan Böhlmark, Arutiun P. Ehiasarian and Jon Tomas Gudmundsson
  Ionized physical vapor deposition (IPVD): A review of technology and applications
  Thin Solid Films, 2006, 513(1-2), 1-24.
 Web of Science® Times Cited: 307

Jones Alami, Per Eklund, Jens Emmerlich, O. Wilhelmsson, U. Jansson, Hans Högberg, Lars Hultman and Ulf Helmersson
  High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target
  Thin Solid Films, 2006, 515(4), 1731-1736.
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 Web of Science® Times Cited: 51

Johan Böhlmark, M. Östbye, Martina Lattemann, H. Ljungcrantz, T. Rosell and Ulf Helmersson
  Guiding the deposition flux in an ionized magnetron discharge
  Thin Solid Films, 2006, 515(4), 1928-1931.
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 Web of Science® Times Cited: 36

Johan Böhlmark, Martina Lattemann, J.T. Gudmundsson, A.P. Ehiasarian, Y. Aranda Gonzalvo, N. Brenning and Ulf Helmersson
  The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
  Thin Solid Films, 2006, 515(4), 1522-1526.
 Web of Science® Times Cited: 103

Jon M. Andersson, Erik Wallin, E. Peter Münger and Ulf Helmersson
  Molecular content of the deposition flux during reactive Ar/O2 magnetron sputtering of Al
  Applied Physics Letters, 2006, 88(05), Art. No. 054101 JAN 30 2006.
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 Web of Science® Times Cited: 7

Jon M. Andersson, Erik Wallin, Peter Münger and Ulf Helmersson
  Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
  Journal of Applied Physics, 2006, 100(3), Art. No. 033305 AUG 1 2006.
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 Web of Science® Times Cited: 21

David Huy Trinh, Hans Högberg, Jon M. Andersson, M. Collin, I. Reineck, Ulf Helmersson and Lars Hultman
  Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2006, 24(2), 309-316.
 Web of Science® Times Cited: 14

Jon Martin Andersson, Erik Wallin, Ulf Helmersson, U. Kreissig and E. Peter Münger
  Phase control of Al2O3 thin films grown at low temperatures
  Thin Solid Films, 2006, 513(1-2), 57-59.
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 Web of Science® Times Cited: 44

Shinji Nakagomia, Gunilla Wingqvist, Elisabeth Åbom, Ulf Helmersson and Anita Lloyd-Spets
  Hydrogen sensing by NKN thin film with high dielectric constant and ferroelectric property
  Sensors and actuators. B, Chemical, 2005, 108, 490-495.
 Web of Science® Times Cited: 3

T. Nyberg, S. Berg, Ulf Helmersson and K. Hartig
  Eliminating the hysteresis effect for reactive sputtering processes
  Applied Physics Letters, 2005, 86(16), 164106.
 Web of Science® Times Cited: 16

Fredrik Söderlind, Per-Olov Käll and Ulf Helmersson
  Sol–gel synthesis and characterization of Na0.5K0.5NbO3 thin films
  Journal of Crystal Growth, 2005, 281(2-4), 468-474.
 Web of Science® Times Cited: 36

Jones Alami, J. T. Gudmundsson, Johan Böhlmark, Jens Birch and Ulf Helmersson
  Plasma dynamics in a highly ionized pulsed magnetron discharge
  Plasma sources science & technology (Print), 2005, 14(3), 525-531.
 Web of Science® Times Cited: 51

K. B. Gylfason, Jones Alami, Ulf Helmersson and J. T. Gudmundsson
  Ion-accoustic solitary waves in a high power pulsed magnetron sputtering discharge
  Journal of Physics D: Applied Physics, 2005, 38(18), 3417-3421.
 Web of Science® Times Cited: 24

Jones Alami, Per O. Å. Persson, Denis Music, J. T. Gudmundsson, Johan Böhlmark and Ulf Helmersson
  Ion-assisted Physical Vapor Deposition for enhanced film properties on non-flat surfaces
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2005, 23(2), 278-280.
 Web of Science® Times Cited: 84

Jon M. Andersson, Erik Wallin, Valeriu Chirita, E. Peter Münger and Ulf Helmersson
  Ab initio calculations on the effects of additives on alumina phase stability
  Physical review. B, Condensed matter and materials physics, 2005, 71(014101), 014101.
 Web of Science® Times Cited: 11

Johan Böhlmark, Jones Alami, Chris Christou, Arutiun P. Ehiasarian and Ulf Helmersson
  Ionization of sputtered metals in high power pulsed magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2005, 23(1), 18-22.
 Web of Science® Times Cited: 85

Johan Böhlmark, J. T. Gudmundsson, Jones Alami, Martina Lattemann and Ulf Helmersson
  Spatial electron density distribution in a high-power pulsed magnetron discharge
  IEEE Transactions on Plasma Science, 2005, 33(2), 346-347.
 Web of Science® Times Cited: 53

Denis Music, Valeriu Chirita, Jochen Schneider and Ulf Helmersson
  Effect of chemical composition on the elastic and electrical properties of the boron-oxygen-yttrium system studied by ab initio and experimental means
  Physical Review B. Condensed Matter and Materials Physics, 2004, 69(9), .
 Web of Science® Times Cited: 1

Veronika Mozhdeh Kugler, Fredrik Söderlind, Denis Music, Ulf Helmersson, J. Andreasson and T. Lindback
  Microstructure/dielectric property relationship of low temperature synthesised (Na,K)NbOx thin films
  Journal of Crystal Growth, 2004, 262(1-4), 322-326.
 Web of Science® Times Cited: 14

N. Konofaos, E.K. Evangelou, Z. Wang and Ulf Helmersson
  Properties of Al-SrTiO3-ITO capacitors for microelectronic device applications
  IEEE Transactions on Electron Devices, 2004, 51(7), 1202-1205.
 Web of Science® Times Cited: 5

A. P. Ehiasarian, P. Eh. Hovsepian, Lars Hultman and Ulf Helmersson
  Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique
  Thin Solid Films, 2004, 457(2), 270-277.
 Web of Science® Times Cited: 99

Jon M. Andersson, Zs. Czigány, P. Jin and Ulf Helmersson
  Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2004, 22(1), 117-121.
 Web of Science® Times Cited: 46

Erik Wallin, Jon M. Andersson, Valeriu Chirita and Ulf Helmersson
  Effects of additives in α- and θ-alumina: an ab initio study
  Journal of Physics: Condensed Matter, 2004, 16(49), 8971-8980.
 Web of Science® Times Cited: 12

Johan Böhlmark, Ulf Helmersson, Michael VanZeeland, I. Axnäs, Jones Alami and Nils Brenning
  Measurement of the magnetic field change in a pulsed high current magnetron discharge
  Plasma Sources Science and Technology, 2004, 13(4), 654-661.
 Web of Science® Times Cited: 38

Denis Music, U. Kreissig, Valeriu Chirita, J.M. Schneider and Ulf Helmersson
  Elastic modulus of amorphous boron suboxide thin films studied by theoretical and experimental methods
  Journal of Applied Physics, 2003, 93(2), 940-944.
 Web of Science® Times Cited: 12

A.P. Ehiasarian, W.-D. Munz, Lars Hultman, Ulf Helmersson and I. Petrov
  High power pulsed magnetron sputtered CrNx films
  Surface & Coatings Technology, 2003, 163-164, 267-272.
 Web of Science® Times Cited: 139

Denis Music, U. Kreissig, Zs. Czigany, Ulf Helmersson and Jochen Schneider
  Elastic modulus-density relationship for amorphous boron suboxide thin films
  Applied Physics A: Materials Science & Processing, 2003, 76(2), 269-271.
 Web of Science® Times Cited: 16

Denis Music, Valeriu Chirita, U. Kreissig, Z. Czigany, J.M. Schneider and Ulf Helmersson
  Quantum design and synthesis of a boron-oxygen-yttrium phase
  Applied Physics Letters, 2003, 82(24), 4286-4288.
 Web of Science® Times Cited: 2

Denis Music, Veronika Mozhdeh Kugler, Zolt Czigany, Axel Flink, Oskar Werner, J.M. Schneider, Lars Hultman and Ulf Helmersson
  Role of carbon in boron suboxide thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2003, 21(4), 1355-1358.
 Web of Science® Times Cited: 5

Veronika Mozhdeh Kugler, Fredrik Söderlind, Denis Music, Ulf Helmersson, J. Andreasson and T. Lindback
  Low temperature growth and characterization of (Na,K)NbOx thin films
  Journal of Crystal Growth, 2003, 254(3-4), 400-404.
 Web of Science® Times Cited: 12

Xiangjun Wang, S Olafsson, LD Madsen, S Rudner, Ivan Gueorguiev Ivanov, A Grishin and Ulf Helmersson
  Growth and characterization of Na0.5K0.5NbO3 thin films on polycrystalline Pt80Ir20 substrates
  Journal of Materials Research, 2002, 17(5), 1183-1191.
 Web of Science® Times Cited: 17

HW Hugosson, GE Grechnev, R Ahuja, Ulf Helmersson, L Sa and Olivia Eriksson
  Stabilization of potential superhard RuO2 phases: A theoretical study
  Physical Review B. Condensed Matter and Materials Physics, 2002, 66(17), .
 Web of Science® Times Cited: 10

Denis Music, Jochen Schneider, Veronika Mozhdeh Kugler, S. Nakao, P. Jin, Mattias Östblom, Lars Hultman and Ulf Helmersson
  Synthesis and mechanical properties of boron suboxide thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2002, 20(2), 335-337.
 Web of Science® Times Cited: 15

A.P. Ehiasarian, R. New, W.-D. Munz, Lars Hultman, Ulf Helmersson and V. Kouznetsov
  Influence of high power densities on the composition of pulsed magnetron plasmas
  Vacuum, 2002, 65(2), 147-154.
 Web of Science® Times Cited: 150

N. Konofaos, E.K. Evangelou, Z. Wang, Veronika Mozhdeh Kugler and Ulf Helmersson
  Electrical characterisation of SrTiO3/Si interfaces
  Journal of Non-Crystalline Solids, 2002, 303(1), 185-189.
 Web of Science® Times Cited: 16

Z. Wang, Veronika Mozhdeh Kugler, Ulf Helmersson, E.K. Evangelou, N. Konofaos, S. Nakao and P. Jin
  Characteristics of SrTiO3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures
  Philosophical Magazine B, 2002, 82(8), 891-903.
 Web of Science® Times Cited: 13

Z. Wang, Ulf Helmersson and Per-Olov Käll
  Optical properties of anatase TiO2 thin films prepared by aqueous sol-gel process at low temperature
  Thin Solid Films, 2002, 405, 50-54.
 Web of Science® Times Cited: 146

S. Nakao, P. Jin, Denis Music, Ulf Helmersson, M. Ikeyama, Y. Miyagawa and S. Miyagawa
  Influence of high-energy Si+ ion irradiation on microstructure and mechanical properties of alumina films
  Surface & Coatings Technology, 2002, 158-159, 534-537.
 Web of Science® Times Cited: 6

P. Jin, G. Xu, M. Tazawa, K. Yoshimura, Denis Music, Jones Alami and Ulf Helmersson
  Low temperature deposition of a-Al2O3 thin films by sputtering using a Cr2O3 template
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2002, 20(6), 2134-2136.
 Web of Science® Times Cited: 51

J. T. Gudmundsson, Jones Alami and Ulf Helmersson
  Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
  Surface and Coatings Technology, 2002, 161(2-3), 249-256.
 Web of Science® Times Cited: 94

ZC Wang, XF Hu, Per-Olov Käll and Ulf Helmersson
  High Li+-ion storage capacity and double-electrochromic behavior of sol-gel-derived iron oxide thin films with sulfate residues
  Chemistry of Materials, 2001, 13(6), 1976-1983.
 Web of Science® Times Cited: 15

Z. Wang, Veronika Mozhdeh Kugler, Ulf Helmersson, N. Konofaos, E.K. Evangelou, S. Nakao and P. Jin
  Electrical properties of SrTiO3 thin films on Si deposited by magnetron sputtering at low temperature
  Applied Physics Letters, 2001, 79(10), 1513-1515.
 Web of Science® Times Cited: 34

J. T. Gudmundsson, Jones Alami and Ulf Helmersson
  Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
  Applied Physics Letters, 2001, 78(22), 3427.
 Web of Science® Times Cited: 71

HG Svavarsson, S Olafsson, N Hellgren and Ulf Helmersson
  Electrostatic powder impact deposition (EPID) of Ge on Si and Cu substrates, microstructure and morphology study
  Journal of Physics D: Applied Physics, 2000, 33(10), 1155-1160.

Xin Wang, S. Olafsson, P. Sandstrom and Ulf Helmersson
  Growth of SrTiO3 thin films on LaAlO3(001) substrates, the influence of growth temperature on composition, orientation, and surface morphology
  Thin Solid Films, 2000, 360(1-2), 181-186.
 Web of Science® Times Cited: 5

K. Macak, V. Kouznetsov, Jochen Schneider, Ulf Helmersson and I. Petrov
  Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2000, 18(4 II), 1533-1537.
 Web of Science® Times Cited: 120

B. Skarman, L.R. Wallenberg, S.N. Jacobsen, Ulf Helmersson and C. Thelander
  Evaluation of intermittent contact mode AFM probes by HREM and using atomically sharp CeO2 ridges as tip characterizer
  Langmuir, 2000, 16(15), 6267-6277.
 Web of Science® Times Cited: 25

P. Jin, M. Tazawa, K. Yoshimura, K. Igarashi, S. Tanemura, K. MacAk and Ulf Helmersson
  Epitaxial growth of W-doped VO2/V2O3 multilayer on a-Al2O3(110) by reactive magnetron sputtering
  Thin Solid Films, 2000, 375(1-2), 128-131.
 Web of Science® Times Cited: 27

Xin Wang, Ulf Helmersson, Lynnette D Madsen, Ivan Ivanov, Peter Münger, Staffan Rudner, B Hjörvarsson and Jan-Erik Sundgren
  Composition, structure, and dielectric tunability of epitaxial SrTiO3 thin films grown by radio frequency magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 1999, 17(2), 564-570.

Anita Spetz, Ulf Helmersson, F. Enquist, M. Armgarth and Ingemar Lundström
  Structure and ammonia sensitivity of thin platinum or iridium gates in metal-oxide-silicon capacitors
  Thin Solid Films, 1989, 177(1-2), 77-93.
 Web of Science® Times Cited: 37

Conference Articles

Robert Boyd, Rickard Gunnarsson, Iris Pilch and Ulf Helmersson
  Characterisation of Nanoparticle Structure by High Resolution Electron Microscopy
  Electron Microscopy and Analysis Group Conference  (EMAG2013), 2014.


Ulf Helmersson, Daniel Söderström, I. Pilch, Sankara Pillay and N. Brenning
  A novel pulsed high-density plasma process for nanoparticle synthesis
  Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012:  , 2012.


Iris Pilch, Daniel Söderström, Nils Brenning and Ulf Helmersson
  Synthesis of copper nanoparticles by a high power pulse hollow cathode
  Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012, 2012.


M. Stahl, H. Kersten, Daniel Lundin and Ulf Helmersson
  Energy influx measurements in HiPIMS plasmas
  36th EPS Conference on Plasma Physics 2009, EPS 2009 - Europhysics Conference Abstracts, vol 33 E1, 2009.


Montri Aiempanakit, Daniel Lundin, Petter Larsson, Daniel Jädernäs and Ulf Helmersson
  Effects on deposition rate when varying the magnetic field strength in magnetron sputtering
  14th International Congress on Thin Films,2008, 2008.


Ulf Helmersson
  High Power Impulse Magnetron Sputtering - HiPIMS
  The 11:th International Conference on Plasma Surface Engineering,2008, 2008.


Ulf Helmersson
  Reactive HiPIMS Deposition of TiN and AI2O3
  HIPIMS Days,2008, 2008.


Ulf Helmersson
  High Power Impulse Magnetron Sputtering for Improved Thin Films and Thin Film Processes
  The 5th Symposium on Functional Coatings and Surface Engineering,2008, 2008.


Ulf Helmersson
  Ionized-PVD with HIPIMS - Industrial Potentials and Scientific Challenges
  35th International Conference on Metallurgical Coatings and Thin Films,2008, 2008.


Ulf Helmersson, Erik Wallin and Martina Lattemann
  Hysteresis-free reactive deposi-tion of alpha-Al2O3 using high HIPIMS
  HIPIMS ABS-Days Conference,2007, 2007.


Ulf Helmersson, Martina Ahlberg and Martina Lattemann
  The effect on film microstructure from the use of energetic deposition by HIPIMS
  SVC Annual Technical Conference,2007, 2007.


Ulf Helmersson
  The use of high power impulse magnetron sputtering for improved thin film depositions
  International Colloquium on Plasma Processes,2007, 2007.


Ulf Helmersson
  Ionized deposition using high power impulse magnetron sputtering
  The annual one day meeting on Plasmas, Surfaces and Thin Films,2007, 2007.


Pall Sigurjonsson, Daniel Lundin, Jon Tomas Gudmundsson and Ulf Helmersson
  Electron energy in high power impulse magnetron sputtering (HiPIMS) discharge
  Symposium on Ionized Physical Vapor Deposition,2007, 2007.


Daniel Jädernäs, Martina Lattemann and Ulf Helmersson
  Interface engineering and surface pretreatment utilizing ionized PVD
  Symposium on Ionized Physical Vapor Deposition,2007, 2007.


Markus Bauer and Ulf Helmersson
  Gas-rarefaction in High Power Impulse Magnetron Sputtering
  Symposium on Ionized Physical Vapor Deposition,2007, 2007.


Erik Wallin, S Svedin, Martina Lattemann and Ulf Helmersson
  Deposition of crystalline alumina by reactive high power impulse magnetron sputtering
  International Vacuum Congress,2007, 2007.


Daniel Lundin, Scott Kirkpatrick, Nils Brenning and Ulf Helmersson
  Anomalous electron transport in high power impulse magnetron sputtering plasmas
  International Vacuum Congress,2007, 2007.


Daniel Jädernäs, Martina Lattemann and Ulf Helmersson
  Interface engineering and surface pretreatment utilizing ionized PVD
  International Vacuum Congress,2007, 2007.


Martina Lattemann and Ulf Helmersson
  Effect of adspecies flux on texture and structure evolution in TiN thin films deposited by pulsed i-PVD
  International Vacuum Congress,2007, 2007.


Nils Brenning, Daniel Lundin, Scott Kirkpatrick and Ulf Helmersson
  Anomalous transport through lower-hybrid waves in a HIPIMS sputtering magnetron
  International Vacuum Congress,2007, 2007.


Martina Lattemann, Erik Wallin and Ulf Helmersson
  Microstructure evolution in high power impulse magnetron sputtering deposited titanium nitride
  AVS 54th International Symposium,2007, 2007.


Ulf Helmersson, Erik Wallin and Martina Lattemann
  Reactive High Power Impulse Magnetron Sputter Deposition of Alumina
  AVS 54th International Symposium,2007, 2007.


Erik Wallin and Ulf Helmersson
  Hysteresis-free reactive high power impulse magnetron sputtering
  The Symposium on Reactive Sputter Deposition,2007, 2007.


Ulf Helmersson
  The use of high power impulse magnetron sputtering for improved thin films and thin film processes
  International Workshop on Plasma-Based Ion Implantation Deposition,2007, 2007.


Martina Lattemann and Ulf Helmersson
  HIPIMS I-PVD the easy way?
  Symposium on Vacuum Based Science and Technology,2007, 2007.


Pall Sigurjonsson, Daniel Lundin, Ulf Helmersson and Jon Tomas Gudmundsson
  The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)
  60th Gaseous Electronics Conference,2007, 2007.


Daniel Jädernäs, Martina Lattemann and Ulf Helmersson
  Interface investigation of steel substrates pretreated by high power impulse magnetron sputtering
  AVS 54th International Symposium,2007, 2007.


Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  AVS 54th International Symposium,2007, 2007.


Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  International Symposium on Reactive Sputter Deposition,2007, 2007.


Johan Böhlmark, Martina Lattemann, H. Stranning, T. Selinder, J. Carlsson and Ulf Helmersson
  Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS)
  Society of Vacuum Coaters, 49th Annual Technical Conference Proceedings,2006, 2006.


Ulf Helmersson
  Ionized physical vapor deposition (IPVD) and especially high power impulse magnetron sputtering (HIPIMS)
  4e Journees detude sur les nouvelles tendances en procedes magnetron et arc pour le depot de couches minces,2006, 2006.


A.P. Ehiasarian, P.Eh. Hovsepian, Martina Lattemann, Johan Böhlmark and Ulf Helmersson
  High Power Impulse Magnetron Sputtering (HIPIMS) Pre-treatment for the Deposition of Hard Coatings
  48th Annual Technical Conference Society of Vacuum Coaters,2005, 2005.


Johan Böhlmark, A.P. Ehiasarian, Martina Lattemann, Jones Alami and Ulf Helmersson
  The Ion Energy Distributions in a High Power Impulse Magnetron Plasma
  48th Annual Technical Conference of the Society of Vacuum Coaters,2005, 2005.


Ulf Helmersson, Martina Lattemann, Jones Alami, Johan Böhlmark, A.P. Ehiasarian and J.T. Gudmundsson
  High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review
  48th Annual Technical Conference of the Society of Vacuum Coaters,2005, 2005.


S. Abadei, S. Gevorgian, Veronika Mozhdeh Kugler, Ulf Helmersson and J. Andreasson
  Microwave properties of tunable capacitors basee on magnetron sputtered ferroelectric Na0.5K0.5NbO3 film on low and high resistivity silicon substrates
  Integrated Ferroelectrics, 2001.


Ph.D. Theses

Daniel Magnfält
  Fundamental processes in thin film growth: The origin of compressive stress and the dynamics of the early growth stages
  2014.


  Fulltext PDF

Asim Aijaz
  Synthesis of Carbon-based and Metal-Oxide Thin Films using High Power Impulse Magnetron Sputtering
  2014.


  Fulltext PDF

Montri Aiempanakit
  Reactive High Power Impulse Magnetron Sputtering of Metal Oxides
  2013.


  Fulltext PDF

Mattias Samuelsson
  Fundamental aspects of HiPIMS under industrial conditions
  2012.


  Fulltext PDF

Daniel Lundin
  The HiPIMS Process
  2010.


  Fulltext PDF

Erik Wallin
  Alumina Thin Films: From Computer Calculations to Cutting Tools
  2008.


  Fulltext PDF

Johan Böhlmark
  Fundamentals of High Power Impulse Magnetron Sputtering
  2006.


  Fulltext PDF

Jones Alami
  Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
  2005.


  Fulltext PDF

Jon Martin Andersson
  Controlling the Formation and Stability of Alumina Phases
  2005.


  Fulltext PDF

Licentiate Theses

Daniel Magnfält
  Nucleation and stress generation in thin films deposited with a pulsed energetic deposition flux
  2013.


  Fulltext PDF

Asim Aijaz
  HiPIMS-based Novel Deposition Processes for Thin Films
  2012.


  Fulltext PDF

Mattias Samuelsson
  High power impulse magnetron sputtering under industrial conditions
  2011.


  Fulltext PDF

Daniel Lundin
  Plasma properties in high power impulse magnetron sputtering
  2008.


  Fulltext PDF

Erik Wallin
  Alumina Thin Film Growth: Experiments and Modeling
  2007.


  Fulltext PDF