Publications for Torbjörn Joelsson
Co-author map based on ISI articles 2007-

Keywords

x-ray tisub>aln tin temperature system superlattice substrates stress sputtering reactive phases nitrogen nitride microscopy materials magnetron hardnesses film crystals coatings

Journal Articles

Torbjörn Joelsson, Axel Flink, Jens Birch and Lars Hultman
  Deposition of single-crystal Ti2AlN thin films by reactive magnetron sputtering from a 2Ti:Al compound target
  Journal of Applied Physics, 2007, 102(7), 074918.
 Web of Science® Times Cited: 14

Per Eklund, Torbjörn Joelsson, Henrik Ljungcrantz, Ola Wilhelmsson, Zsolt Czigany, Hans Högberg and Lars Hultman
  Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films
  Surface and Coatings Technology, 2007, 201(14), 6465-6469.
 Web of Science® Times Cited: 14

Jens Birch, Torbjörn Joelsson, Fredrik Eriksson, Naureen Ghafoor and Lars Hultman
  Single crystal CrN/ScN superlattice soft X-ray mirrors: epitaxial growth, structure, and properties
  Thin Solid Films, 2006, 514(1-2), 10-19.
 Web of Science® Times Cited: 10

Torbjörn Joelsson, Anders Hörling, Jens Birch and Lars Hultman
  Single-crystal Ti2AlN thin films
  Applied Physics Letters, 2005, 86(11), 111913.
 Web of Science® Times Cited: 48

Torbjörn Joelsson, Lars Hultman, Håkan Hugosson and Jon M. Molina-Aldareguia
  Phase stability tuning in the NbxZr1−xN thin-film system for large stacking fault density and enhanced mechanical strength
  Applied Physics Letters, 2005, 86(13), 131922.
 Web of Science® Times Cited: 25

Hans Högberg, Lars Hultman, Jens Emmerlich, Torbjörn Joelsson, Per Eklund, Jon M. Molina-Aldareguia, Jens-Petter Palmquist, Ola Wilhelmsson and Ulf Jansson
  Growth and characterization of MAX-phase thin films
  Surface & Coatings Technology, 2005, 193(1-3), 6-10.
 Web of Science® Times Cited: 95

J.M. Molina-Aldareguia, S.J. Lloyd, Magnus Odén, Torbjörn Joelsson, Lars Hultman and W.J. Clegg
  Deformation structures under indentations in TiN/NbN single-crystal multilayers deposited by magnetron sputtering at different bombarding ion energies
  Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties, 2002, 82(10 SPEC.), 1983-1992.
 Web of Science® Times Cited: 39

M. Nordin, M. Larsson, Torbjörn Joelsson, Jens Birch and Lars Hultman
  Residual stress formation in multilayered TiN/TaNx coatings during reactive magnetron sputter deposition
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2000, 18(6), 2884-2889.
 Web of Science® Times Cited: 1

Conference Articles

Christer Hallin, Torbjörn Joelsson and Erik Janzén
  The effect of thermal gradients on SiC wafers
  Materials Science Forum, Vols. 433-436, 2003.


Ph.D. Theses

Mattias Samuelsson
  Fundamental aspects of HiPIMS under industrial conditions
  2012.


  Fulltext PDF

Torbjörn Joelsson
  Nanostructural design of transition metal nitride thin films
  2005.