Publications for Torbjörn Joelsson

Co-author map based on Web of Sciences articles 2007-

Journal Articles

Torbjörn Joelsson, Axel Flink, Jens Birch and Lars Hultman
  Deposition of single-crystal Ti2AlN thin films by reactive magnetron sputtering from a 2Ti:Al compound target
  Journal of Applied Physics, 2007, 102(7), 074918.
 Web of Science® Times Cited: 17

Per Eklund, Torbjörn Joelsson, Henrik Ljungcrantz, Ola Wilhelmsson, Zsolt Czigany, Hans Högberg and Lars Hultman
  Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films
  Surface and Coatings Technology, 2007, 201(14), 6465-6469.
 Web of Science® Times Cited: 18

Jens Birch, Torbjörn Joelsson, Fredrik Eriksson, Naureen Ghafoor and Lars Hultman
  Single crystal CrN/ScN superlattice soft X-ray mirrors: epitaxial growth, structure, and properties
  Thin Solid Films, 2006, 514(1-2), 10-19.
 Web of Science® Times Cited: 11

Hans Högberg, Lars Hultman, Jens Emmerlich, Torbjörn Joelsson, Per Eklund, Jon M. Molina-Aldareguia, Jens-Petter Palmquist, Ola Wilhelmsson and Ulf Jansson
  Growth and characterization of MAX-phase thin films
  Surface & Coatings Technology, 2005, 193(1-3), 6-10.
 Web of Science® Times Cited: 104

Torbjörn Joelsson, Lars Hultman, Håkan Hugosson and Jon M. Molina-Aldareguia
  Phase stability tuning in the NbxZr1−xN thin-film system for large stacking fault density and enhanced mechanical strength
  Applied Physics Letters, 2005, 86(13), 131922.
 Web of Science® Times Cited: 28

Torbjörn Joelsson, Anders Hörling, Jens Birch and Lars Hultman
  Single-crystal Ti2AlN thin films
  Applied Physics Letters, 2005, 86(11), 111913.
 Web of Science® Times Cited: 51

J.M. Molina-Aldareguia, S.J. Lloyd, Magnus Odén, Torbjörn Joelsson, Lars Hultman and W.J. Clegg
  Deformation structures under indentations in TiN/NbN single-crystal multilayers deposited by magnetron sputtering at different bombarding ion energies
  Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties, 2002, 82(10 SPEC.), 1983-1992.
 Web of Science® Times Cited: 39

M. Nordin, M. Larsson, Torbjörn Joelsson, Jens Birch and Lars Hultman
  Residual stress formation in multilayered TiN/TaNx coatings during reactive magnetron sputter deposition
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2000, 18(6), 2884-2889.
 Web of Science® Times Cited: 1

Conference Articles

Christer Hallin, Torbjörn Joelsson and Erik Janzén
  The effect of thermal gradients on SiC wafers
  Materials Science Forum, Vols. 433-436, 2003.

Ph.D. Theses

Mattias Samuelsson
  Fundamental aspects of HiPIMS under industrial conditions

  Fulltext PDF

Torbjörn Joelsson
  Nanostructural design of transition metal nitride thin films