Publications for Kostas Sarakinos
Co-author map based on ISI articles 2007-

Publications mentioned in social media 2 times*

Keywords

vapor sputtering species reactive pulsed power plasma magnetron ionization ion hipims growing flux film energy energetic deposited dcms bombardment atoms

Journal Articles

Steffen Sønderby, Asim Aijaz, Ulf Helmersson, Kostas Sarakinos and Per Eklund
  Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering
  Surface & Coatings Technology, 2014, 240, 1-6.
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Asim Aijaz, Kostas Sarakinos, Mohsin Raza, Jens Jensen and Ulf Helmersson
  Principles for designing sputtering-based strategies for high-rate synthesis of dense and hard hydrogenated amorphous carbon thin films
  Diamond and related materials, 2014, 44, 117-122.

Viktor Elofsson, Daniel Magnfält, Peter Münger and Kostas Sarakinos
  Unravelling the Physical Mechanisms that Determine Microstructural Evolution of Ultrathin Volmer-Weber Films
  Journal of Applied Physics, 2014, 116(4), 044302.
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Daniel Magnfält, G Abadias and Kostas Sarakinos
  Atom insertion into grain boundaries and stress generation in physically vapor deposited films
  Applied Physics Letters, 2013, 103(5), .
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 Web of Science® Times Cited: 1

Viktor Elofsson, Daniel Magnfält, M Samuelsson and Kostas Sarakinos
  Tilt of the columnar microstructure in off-normally deposited thin films using highly ionized vapor fluxes
  Journal of Applied Physics, 2013, 113(17), 7 pages.
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 Web of Science® Times Cited: 2

Daniel Magnfält, Viktor Elofsson, G Abadias, Ulf Helmersson and Kostas Sarakinos
  Time-domain and energetic bombardment effects on the nucleation and coalescence of thin metal films on amorphous substrates
  Journal of Physics D: Applied Physics, 2013, 46(21), .
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 Web of Science® Times Cited: 4

Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Bjorefors, Bengt Walivaara, Henrik Ljungcrantz and Ulf Helmersson
  Influence of ionization degree on film properties when using high power impulse magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(3), 031507.
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 Web of Science® Times Cited: 6

Daniel Lundin and Kostas Sarakinos
  An introduction to thin film processing using high-power impulse magnetron sputtering
 
Altmetric usage: 2

  Journal of Materials Research, 2012, 27(5), 780-792.
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 Web of Science® Times Cited: 35

Kostas Sarakinos, A Braun, C Zilkens, S Mraz, J M Schneider, H Zoubos and P Patsalas
  Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films
  Surface & Coatings Technology, 2012, 206(10), 2706-2710.
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 Web of Science® Times Cited: 11

Asim Aijaz, Kostas Sarakinos, Daniel Lundin, Nils Brenning and Ulf Helmersson
  A strategy for increased carbon ionization in magnetron sputtering discharges
  Diamond and related materials, 2012, 23, 1-4.
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 Web of Science® Times Cited: 15

Mattias Samuelsson, Kostas Sarakinos, Hans Högberg, Erik Lewin, Ulf Jansson, Bengt Wälivaara, Henrik Ljungcrantz and Ulf Helmersson
  Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
  Surface & Coatings Technology, 2012, 206(8-9), 2396-2402.
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 Web of Science® Times Cited: 7

Kaiyun Jiang, Kostas Sarakinos, Adil Atiser, Alexander Reinholdt, Joachim Mayer and Jochen M. Schneider
  On the high temperature stability of gamma-Al2O3/Ti0.33Al0.67N coated WC-Co cutting inserts
  International Journal of Materials Research - Zeitschrift für Metallkunde, 2012, 103(12), 1509-1516.

Denis Music, Farwah Nahif, Kostas Sarakinos, Niklas Friederichsen and Jochen M. Schneider
  Ab initio molecular dynamics of Al irradiation-induced processes during Al(2)O(3) growth
  Applied Physics Letters, 2011, 98(11), 111908.
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 Web of Science® Times Cited: 7

Montri Aiempanakit, Tomas Kubart, Petter Larsson, Kostas Sarakinos, Jens Jensen and Ulf Helmersson
  Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
  Thin Solid Films, 2011, 519(22), 7779-7784.
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 Web of Science® Times Cited: 11

Kaiyun Jiang, Denis Music, Kostas Sarakinos and Jochen M. Schneider
  Ab initio study of effects of substitutional additives on the phase stability of gamma-alumina
  Journal of Physics: Condensed Matter, 2010, 22(50), 505502.
 Web of Science® Times Cited: 8

Kaiyun Jiang, Kostas Sarakinos, Stephanos Konstantinidis and Jochen M. Schneider
  Low temperature synthesis of alpha-Al(2)O(3) films by high-power plasma-assisted chemical vapour deposition
  Journal of Physics D: Applied Physics, 2010, 43(32), 325202.
 Web of Science® Times Cited: 11

Kostas Sarakinos, D. Music, F. Nahif, K. Jiang, A. Braun, C. Zilkens and J. M. Schneider
  Ionized physical vapor deposited Al(2)O(3) films: Does subplantation favor formation of alpha-Al(2)O(3)?
  Physica Status Solidi. Rapid Research Letters, 2010, 4(7), 154-156.
 Web of Science® Times Cited: 14

Kostas Sarakinos, D. Music, S. Mraz, M. To Baben, K. Jiang, F. Nahif, A. Braun, C. Zilkens, S. Konstantinidis, F. Renaux, D. Cossement, F. Munnik and J. M. Schneider
  On the phase formation of sputtered hafnium oxide and oxynitride films
  Journal of Applied Physics, 2010, 108(1), 014904.
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 Web of Science® Times Cited: 12

Kostas Sarakinos, J. Alami and S. Konstantinidis
  High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
  Surface & Coatings Technology, 2010, 204(11), 1661-1684.
 Web of Science® Times Cited: 170

J. Alami, S. Bolz and Kostas Sarakinos
  High power pulsed magnetron sputtering: Fundamentals and applications
  Journal of Alloys and Compounds, 2009, 483(1-2), 530-534.
 Web of Science® Times Cited: 27

J. Alami, Kostas Sarakinos, F. Uslu, C. Klever, J. Dukwen and M. Wuttig
  On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering
  Journal of Physics D: Applied Physics, 2009, 42(11), 115204.
 Web of Science® Times Cited: 32

J. Alami, Kostas Sarakinos, F. Uslu and M. Wuttig
  On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
  Journal of Physics D: Applied Physics, 2009, 42(1), 015304.
 Web of Science® Times Cited: 43

Kostas Sarakinos, J. Alami, J. Dukwen, J. Woerdenweber and M. Wuttig
  A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering
  Journal of Physics D: Applied Physics, 2008, 41(21), 215301.
 Web of Science® Times Cited: 11

Kostas Sarakinos, J. Alami, C. Klever and M. Wuttig
  Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
  Surface & Coatings Technology, 2008, 202(20), 5033-5035.
 Web of Science® Times Cited: 28

D. Severin, Kostas Sarakinos, O. Kappertz, A. Pflug and M. Wuttig
  Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
  Journal of Applied Physics, 2008, 103(8), 083306.
   Fulltext  PDF  
 Web of Science® Times Cited: 4

Kostas Sarakinos, J. Alami, D. Severin, P .M. Karimi and M. Wuttig
  The effect of the backscattered energetic atoms on the stress generation and the surface morphology of reactively sputtered vanadium nitride films
  Thin Solid Films, 2008, 516(14), 4568-4573.
 Web of Science® Times Cited: 2

Kostas Sarakinos, J. Woerdenweber, F. Uslu, P. Schulz, J. Alami and M. Wuttig
  The effect of the microstructure and the surface topography on the electrical properties of thin Ag films deposited by high power pulsed magnetron sputtering
  Surface & Coatings Technology, 2008, 202(11), 2323-2327.
 Web of Science® Times Cited: 14

Kostas Sarakinos, J. Alami and M. Wuttig
  Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering
  Journal of Physics D: Applied Physics, 2007, 40(7), 2108-2114.
 Web of Science® Times Cited: 55

Kostas Sarakinos, J. Alami, C. Klever and M. Wuttig
  Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target
  REVIEWS ON ADVANCED MATERIALS SCIENCE, 2007, 15(1), 44-48.
 Web of Science® Times Cited: 6

Kostas Sarakinos, J. Alami, P. M. Karimi, D. Severin and M. Wuttig
  The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride
  Journal of Physics D: Applied Physics, 2007, 40(3), 778-785.
 Web of Science® Times Cited: 7

S Logothetidis, N Kalfagiannis, Kostas Sarakinos and P Patsalas
  Investigation of bilayer period and individual layer thickness of CrN/TiN superlattices by ellipsometry and X-ray techniques
  Surface & Coatings Technology, 2006, 200(22-23), 6176-6180.

J. Alami, Kostas Sarakinos, G. Mark and M. Wuttig
  On the deposition rate in a high power pulsed magnetron sputtering discharge
  Applied Physics Letters, 2006, 89(15), 154104.
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S Logothetidis, P Patsalas, Kostas Sarakinos, C Charitidis and C Metaxa
  The effect of crystal structure and morphology on the optical properties of chromium nitride thin films
  Surface & Coatings Technology, 2004, 180, 637-641.

Conference Articles

Kostas Sarakinos, S Kassavetis, P Patsalas and S Logothetidis
  Structural factors determining the nanomechanical performance of transition metal nitride films
  Symposium on Ultrafast Lasers for Materials Science held at the 2004 MRS Fall Meeting, 2005.


Ph.D. Theses

Asim Aijaz
  Synthesis of Carbon-based and Metal-Oxide Thin Films using High Power Impulse Magnetron Sputtering
  2014.


  Fulltext PDF

Licentiate Theses

Viktor Elofsson
  Thin Film Growth using Pulsed and Highly Ionized Vapor Fluxes
  2014.


  Fulltext PDF

Asim Aijaz
  HiPIMS-based Novel Deposition Processes for Thin Films
  2012.


  Fulltext PDF

* Social media data based on publications from 2011 to present and with a DOI; data delivered by Altmetric.com.