Publications for Kostas Sarakinos
Co-author map based on ISI articles 2007-

Publications mentioned in social media 1 times*

Journal Articles

Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Bjorefors, Bengt Walivaara, Henrik Ljungcrantz and Ulf Helmersson
  Influence of ionization degree on film properties when using high power impulse magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(3), 031507.
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 Web of Science® Times Cited: 2

Daniel Lundin and Kostas Sarakinos
  An introduction to thin film processing using high-power impulse magnetron sputtering
 
Altmetric usage: 1

  Journal of Materials Research, 2012, 27(5), 780-792.
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 Web of Science® Times Cited: 12

Kostas Sarakinos, A Braun, C Zilkens, S Mraz, J M Schneider, H Zoubos and P Patsalas
  Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films
  Surface & Coatings Technology, 2012, 206(10), 2706-2710.
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 Web of Science® Times Cited: 4

Asim Aijaz, Kostas Sarakinos, Daniel Lundin, Nils Brenning and Ulf Helmersson
  A strategy for increased carbon ionization in magnetron sputtering discharges
  Diamond and related materials, 2012, 23, 1-4.
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 Web of Science® Times Cited: 5

Mattias Samuelsson, Kostas Sarakinos, Hans Högberg, Erik Lewin, Ulf Jansson, Bengt Wälivaara, Henrik Ljungcrantz and Ulf Helmersson
  Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
  Surface & Coatings Technology, 2012, 206(8-9), 2396-2402.
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 Web of Science® Times Cited: 2

Denis Music, Farwah Nahif, Kostas Sarakinos, Niklas Friederichsen and Jochen M. Schneider
  Ab initio molecular dynamics of Al irradiation-induced processes during Al(2)O(3) growth
  Applied Physics Letters, 2011, 98(11), 111908.
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 Web of Science® Times Cited: 2

Kaiyun Jiang, Denis Music, Kostas Sarakinos and Jochen M. Schneider
  Ab initio study of effects of substitutional additives on the phase stability of gamma-alumina
  Journal of Physics, 2010, 22(50), 505502.
 Web of Science® Times Cited: 4

Kaiyun Jiang, Kostas Sarakinos, Stephanos Konstantinidis and Jochen M. Schneider
  Low temperature synthesis of alpha-Al(2)O(3) films by high-power plasma-assisted chemical vapour deposition
  Journal of Physics D, 2010, 43(32), 325202.
 Web of Science® Times Cited: 4

Kostas Sarakinos, D. Music, F. Nahif, K. Jiang, A. Braun, C. Zilkens and J. M. Schneider
  Ionized physical vapor deposited Al(2)O(3) films: Does subplantation favor formation of alpha-Al(2)O(3)?
  Physica Status Solidi. Rapid Research Letters, 2010, 4(7), 154-156.
 Web of Science® Times Cited: 7

Kostas Sarakinos, D. Music, S. Mraz, M. To Baben, K. Jiang, F. Nahif, A. Braun, C. Zilkens, S. Konstantinidis, F. Renaux, D. Cossement, F. Munnik and J. M. Schneider
  On the phase formation of sputtered hafnium oxide and oxynitride films
  Journal of Applied Physics, 2010, 108(1), 014904.
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 Web of Science® Times Cited: 6

Kostas Sarakinos, J. Alami and S. Konstantinidis
  High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
  Surface & Coatings Technology, 2010, 204(11), 1661-1684.
 Web of Science® Times Cited: 97

J. Alami, S. Bolz and Kostas Sarakinos
  High power pulsed magnetron sputtering: Fundamentals and applications
  Journal of Alloys and Compounds, 2009, 483(1-2), 530-534.

J. Alami, Kostas Sarakinos, F. Uslu, C. Klever, J. Dukwen and M. Wuttig
  On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering
  Journal of Physics D, 2009, 42(11), 115204.

J. Alami, Kostas Sarakinos, F. Uslu and M. Wuttig
  On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
  Journal of Physics D, 2009, 42(1), 015304.

Kostas Sarakinos, J. Alami, J. Dukwen, J. Woerdenweber and M. Wuttig
  A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering
  Journal of Physics D, 2008, 41(21), 215301.

Kostas Sarakinos, J. Alami, C. Klever and M. Wuttig
  Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
  Surface & Coatings Technology, 2008, 202(20), 5033-5035.

D. Severin, Kostas Sarakinos, O. Kappertz, A. Pflug and M. Wuttig
  Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
  Journal of Applied Physics, 2008, 103(8), 083306.
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Kostas Sarakinos, J. Alami, D. Severin, P .M. Karimi and M. Wuttig
  The effect of the backscattered energetic atoms on the stress generation and the surface morphology of reactively sputtered vanadium nitride films
  Thin Solid Films, 2008, 516(14), 4568-4573.

Kostas Sarakinos, J. Woerdenweber, F. Uslu, P. Schulz, J. Alami and M. Wuttig
  The effect of the microstructure and the surface topography on the electrical properties of thin Ag films deposited by high power pulsed magnetron sputtering
  Surface & Coatings Technology, 2008, 202(11), 2323-2327.

Kostas Sarakinos, J. Alami and M. Wuttig
  Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering
  Journal of Physics D, 2007, 40(7), 2108-2114.

Kostas Sarakinos, J. Alami, C. Klever and M. Wuttig
  Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target
  REVIEWS ON ADVANCED MATERIALS SCIENCE, 2007, 15(1), 44-48.

Kostas Sarakinos, J. Alami, P. M. Karimi, D. Severin and M. Wuttig
  The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride
  Journal of Physics D, 2007, 40(3), 778-785.

S Logothetidis, N Kalfagiannis, Kostas Sarakinos and P Patsalas
  Investigation of bilayer period and individual layer thickness of CrN/TiN superlattices by ellipsometry and X-ray techniques
  Surface & Coatings Technology, 2006, 200(22-23), 6176-6180.

J. Alami, Kostas Sarakinos, G. Mark and M. Wuttig
  On the deposition rate in a high power pulsed magnetron sputtering discharge
  Applied Physics Letters, 2006, 89(15), 154104.
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S Logothetidis, P Patsalas, Kostas Sarakinos, C Charitidis and C Metaxa
  The effect of crystal structure and morphology on the optical properties of chromium nitride thin films
  Surface & Coatings Technology, 2004, 180, 637-641.

Licentiate Theses

Asim Aijaz
  HiPIMS-based Novel Deposition Processes for Thin Films
  2012.


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* Social media data based on publications from 2011 to present and with a DOI; data delivered by Altmetric.com.