Torun Berlind, Andrej Furland, Zs. Czigany, Jörg Neidhardt, Lars Hultman and Hans Arwin Spectroscopic ellipsometry characterization of amorphous carbon and amorphous,graphitic and fullerene-like carbon nitride thin films Thin Solid Films, 2009, 517(24), 6652-6658.
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Jörg Neidhardt and Lars Hultman Beyond ?- C3 N4 -Fullerene-like carbon nitride: A promising coating material Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2007, 25(4), 633-644.
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M. Rester, Jörg Neidhardt, Per Eklund, Jens Emmerlich, H. Ljungcrantz, Lars Hultman and C. Mitterer Annealing studies of nanocomposite Ti-Si-C thin films with respect to phase stability and tribological performance Materials Science & Engineering: A, 2006, 429( 1-2), 90-95.
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JF Palacio, SJ Bull, Jörg Neidhardt and Lars Hultman Nanoindentation response of high perfonnance fullerene-like CNx Thin Solid Films, 2006, 494(01-Feb), 63-68.
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Henry Riascos, Jörg Neidhardt, G. Z. Radnoczi, Jens Emmerlich, G. Zambrano, Lars Hultman and P. Prieto Structure and properties of pulsed-laser deposited carbon nitride thin films Thin Solid Films, 2006, 497(1-2), 1-6.
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E. Broitman, V. V. Pushkarev, A. J. Gellman, Jörg Neidhardt, Andrej Furlan and Lars Hultman Water adsorption on lubricated fullerene-like CNx films Thin Solid Films, 2006, 515(3), 979-983.
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R Gago, I Jimenez, Jörg Neidhardt, B Abendroth, I Caretti, Lars Hultman and W Möller Correlation between bonding structure and microstructure in fullerenelike carbon nitride thin films Physical Review B. Condensed Matter and Materials Physics, 2005, 71(12), 125414.
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Jörg Neidhardt, Hans Högberg and Lars Hultman Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering, Suppression of the chemical desorption processes Thin Solid Films, 2005, 478(1-2), 34-41.
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Gueorgui Kostov Gueorguiev, Jörg Neidhardt, Sven Stafström and Lars Hultman First-principles calculations on the curvature evolution and cross-linkage in carbon nitride Chemical Physics Letters, 2005, 410( 4-6), 228-234.
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G.K. Gueorguiev, Jörg Neidhardt, Sven Stafström and Lars Hultman First-principles calculations on the role of CN precursors for the formation of fullerene-like carbon nitride Chemical Physics Letters, 2005, 401(1-3), 288-295.
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R. Gago, Jörg Neidhardt, M. Vinnichenko, U. Kreissig, Zsolt Czigany, A. Kolitsch, Lars Hultman and W. Möller Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: On the mechanisms for fullerene-like microstructure formation Thin Solid Films, 2005, 483(1-2), 89-94.
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Jörg Neidhardt, Hans Högberg and Lars Hultman Arrhenius-type temperature dependence of the chemical desorption processes active during deposition of fullerene-like carbon nitride thin films Surface Science, 2004, 569( 1-3), .
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Jörg Neidhardt, Lars Hultman and Z Czigany Correlated high resolution transmission electron microscopy and X-ray photoelectron spectroscopy studies of structured CNx (0 < x < 0.25) thin solid films Carbon, 2004, 42(Dec-13), 2729-2734.
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I.F. Brunell, L. Pichon, N. Hellgren, Zsolt Czigany, Jörg Neidhardt and Lars Hultman In-situ stress measurement during the deposition of CN x thin films by unbalanced magnetron sputtering; formation of high levels of stress with 28 eV ion irradiation Philosophical Magazine Letters, 2004, 84(6), 395-403.
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Jörg Neidhardt, Lars Hultman, Esteban Broitman, T. W. Scharf and Irwin L. Singer Structural, mechanical and tribological behavior of fullerene-like and amorphous carbon nitride coatings Diamond and related materials, 2004, 13(10), 1882-1888.
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Jörg Neidhardt, Lars Hultman, B. Abendroth, R. Gago and W. Moller Diagnostics of a N2/Ar direct current magnetron discharge for reactive sputter deposition of fullerene-like carbon nitride thin films Journal of Applied Physics, 2003, 94(11), 7059-7066.
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Lars Hultman, Jörg Neidhardt, N Hellgren, H Sjostrom and JE Sundgren Fullerene-like carbon nitride: A resilient coating material MRS bulletin, 2003, 28(3), 194-202.
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Jörg Neidhardt, Zs. Czigany, I.F. Brunell and Lars Hultman Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering, Role of low-energy ion irradiation in determining microstructure and mechanical properties Journal of Applied Physics, 2003, 93(5), 3002-3015.
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Zs. Czigany, Jörg Neidhardt, I.F. Brunell and Lars Hultman Imaging of fullerene-like structures in CNx thin films by electron microscopy, Sample preparation artefacts due to ion-beam milling Ultramicroscopy, 2003, 94(3-4), 163-173.
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J.-P. Palmquist, Zs. Czigany, Magnus Odén, Jörg Neidhardt, Lars Hultman and U. Jansson Magnetron sputtered W-C films with C60 as carbon source Thin Solid Films, 2003, 444(1-2), 29-37.
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Jörg Neidhardt, Z Czigany and Lars Hultman Superelastic fullerene-like carbon nitride coatings synthesised by reactive unbalanced magnetron sputtering Surface Engineering, 2003, 19(4), 299-303.
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I.A. Garcia, E. G.-Berasategui, S.J. Bull, T.F. Page, Jörg Neidhardt, Lars Hultman and N. Hellgren How hard is fullerene-like CNx? Some observations from the nanoindentation response of a magnetron-sputtered coating Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties, 2002, 82(10 SPEC.), 2133-2147.
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E Broitman, N Hellgren, Jörg Neidhardt, I Brunell and Lars Hultman Letter: Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content Journal of Electronic Materials, 2002, 31(9), 957-961.
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Lars Hultman, Sven Stafström, Z Czigany, Jörg Neidhardt, N Hellgren, IF Brunell, K Suenaga and C Colliex Cross-linked nano-onions of carbon nitride in the solid phase: Existence of a novel C48N12 aza-fullerene Physical Review Letters, 2001, 87(22), art. no.-225503.
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Zs. Czigany, I.F. Brunell, Jörg Neidhardt, Lars Hultman and K. Suenaga Growth of fullerene-like carbon nitride thin solid films consisting of cross-linked nano-onions Applied Physics Letters, 2001, 79(16), 2639-2641.
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