Publications for Jon Andersson
Co-author map based on ISI articles 2007-
Journal Articles
Erik Wallin, Jon Martin Andersson, Martina Lattemann and Ulf Helmersson
Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films
Thin Solid Films, 2008, 516(12), 3877-3883.
Fulltext  Web of Science® Times Cited: 12 |
Jon M. Andersson, Erik Wallin, Peter Münger and Ulf Helmersson
Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
Journal of Applied Physics, 2007, 100(3), Art. No. 033305 AUG 1 2006.
Fulltext Web of Science® Times Cited: 17 |
Jones Alami, Per Eklund, Jon M. Andersson, Martina Lattemann, Erik Wallin, Johan Böhlmark, Per Persson and Ulf Helmersson
Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
Thin Solid Films, 2007, 515(7-8), 3434-3438.
Fulltext Web of Science® Times Cited: 35 |
Erik Wallin, Jon Martin Andersson, E. Peter Münger, Valeriu Chirita and Ulf Helmersson
Ab initio studies of Al, O, and O2 adsorption on α-Al2O3 (0001) surfaces
Physical Review B. Condensed Matter and Materials Physics, 2007, 74(12), 125409.
Fulltext Web of Science® Times Cited: 17 |
Jon Martin Andersson, Erik Wallin, Ulf Helmersson, U. Kreissig and E. Peter Münger
Phase control of Al2O3 thin films grown at low temperatures
Thin Solid Films, 2006, 513(1-2), 57-59.
Fulltext Web of Science® Times Cited: 31 |
David Huy Trinh, Hans Högberg, Jon M. Andersson, M. Collin, I. Reineck, Ulf Helmersson and Lars Hultman
Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2006, 24(2), 309-316.
Web of Science® Times Cited: 12 |
Jon M. Andersson, Erik Wallin, E. Peter Münger and Ulf Helmersson
Molecular content of the deposition flux during reactive Ar/O2 magnetron sputtering of Al
Applied Physics Letters, 2006, 88(05), Art. No. 054101 JAN 30 2006.
Fulltext Web of Science® Times Cited: 7 |
Jon M. Andersson, Erik Wallin, Valeriu Chirita, E. Peter Münger and Ulf Helmersson
Ab initio calculations on the effects of additives on alumina phase stability
Physical review. B, Condensed matter and materials physics, 2005, 71(014101), 014101.
Web of Science® Times Cited: 8 |
Erik Wallin, Jon M. Andersson, Valeriu Chirita and Ulf Helmersson
Effects of additives in α- and θ-alumina: an ab initio study
Journal of Physics: Condensed Matter, 2004, 16(49), 8971-8980.
Web of Science® Times Cited: 7 |
Jon M. Andersson, Zs. Czigány, P. Jin and Ulf Helmersson
Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2004, 22(1), 117-121.
Web of Science® Times Cited: 40 |
Conference Articles
Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
AVS 54th International Symposium,2007, 2007.
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Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
International Symposium on Reactive Sputter Deposition,2007, 2007.
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Ph.D. Theses
Ph.D., Lic. Theses
