Publications for Jon Andersson
Co-author map based on ISI articles 2007-

Keywords

temperatures temperature sputtering phases osub> o metastable magnetron ions initio flux film energy deposited alumina al adsorption additives a <img

Journal Articles

Erik Wallin, Jon Martin Andersson, Martina Lattemann and Ulf Helmersson
  Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films
  Thin Solid Films, 2008, 516(12), 3877-3883.
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 Web of Science® Times Cited: 16

Jones Alami, Per Eklund, Jon M. Andersson, Martina Lattemann, Erik Wallin, Johan Böhlmark, Per Persson and Ulf Helmersson
  Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
  Thin Solid Films, 2007, 515(7-8), 3434-3438.
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 Web of Science® Times Cited: 40

Jon Martin Andersson, Erik Wallin, Ulf Helmersson, U. Kreissig and E. Peter Münger
  Phase control of Al2O3 thin films grown at low temperatures
  Thin Solid Films, 2006, 513(1-2), 57-59.
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 Web of Science® Times Cited: 43

David Huy Trinh, Hans Högberg, Jon M. Andersson, M. Collin, I. Reineck, Ulf Helmersson and Lars Hultman
  Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2006, 24(2), 309-316.
 Web of Science® Times Cited: 14

Jon M. Andersson, Erik Wallin, E. Peter Münger and Ulf Helmersson
  Molecular content of the deposition flux during reactive Ar/O2 magnetron sputtering of Al
  Applied Physics Letters, 2006, 88(05), Art. No. 054101 JAN 30 2006.
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 Web of Science® Times Cited: 7

Erik Wallin, Jon Martin Andersson, E. Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of Al, O, and O2 adsorption on α-Al2O3 (0001) surfaces
  Physical Review B. Condensed Matter and Materials Physics, 2006, 74(12), 125409-1-125409-9.
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 Web of Science® Times Cited: 17

Jon M. Andersson, Erik Wallin, Peter Münger and Ulf Helmersson
  Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
  Journal of Applied Physics, 2006, 100(3), Art. No. 033305 AUG 1 2006.
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 Web of Science® Times Cited: 20

Jon M. Andersson, Erik Wallin, Valeriu Chirita, E. Peter Münger and Ulf Helmersson
  Ab initio calculations on the effects of additives on alumina phase stability
  Physical review. B, Condensed matter and materials physics, 2005, 71(014101), 014101.
 Web of Science® Times Cited: 11

Erik Wallin, Jon M. Andersson, Valeriu Chirita and Ulf Helmersson
  Effects of additives in α- and θ-alumina: an ab initio study
  Journal of Physics: Condensed Matter, 2004, 16(49), 8971-8980.
 Web of Science® Times Cited: 12

Jon M. Andersson, Zs. Czigány, P. Jin and Ulf Helmersson
  Microstructure of α-alumina thin films deposited at low temperatures on chromia template layers
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2004, 22(1), 117-121.
 Web of Science® Times Cited: 46

Conference Articles

Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  AVS 54th International Symposium,2007, 2007.


Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  International Symposium on Reactive Sputter Deposition,2007, 2007.


Ph.D. Theses

Jon Martin Andersson
  Controlling the Formation and Stability of Alumina Phases
  2005.


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