Publications for Jones Alami
Co-author map based on ISI articles 2007-

Keywords

temperature ta sputtering sputtered pulsed pulse power plasma peak magnetron magnetic ionized ionization inclination hppms high-power film energy discharge deposited

Journal Articles

Jones Alami, Per Eklund, Jon M. Andersson, Martina Lattemann, Erik Wallin, Johan Böhlmark, Per Persson and Ulf Helmersson
  Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
  Thin Solid Films, 2007, 515(7-8), 3434-3438.
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 Web of Science® Times Cited: 42

Ulf Helmersson, Martina Lattemann, Jones Alami, Johan Böhlmark, A.P. Ehiasarian and J.T. Gudmundsson
  Highly Ionized Sputter Discharges for Thin Film Fabrication
  Bulletin of the Russian Academy of Sciences. Physics, 2006, 70(8), 1421-1424.

Jones Alami, Per Eklund, Jens Emmerlich, O. Wilhelmsson, U. Jansson, Hans Högberg, Lars Hultman and Ulf Helmersson
  High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target
  Thin Solid Films, 2006, 515(4), 1731-1736.
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 Web of Science® Times Cited: 51

Jones Alami, J. T. Gudmundsson, Johan Böhlmark, Jens Birch and Ulf Helmersson
  Plasma dynamics in a highly ionized pulsed magnetron discharge
  Plasma sources science & technology (Print), 2005, 14(3), 525-531.
 Web of Science® Times Cited: 50

K. B. Gylfason, Jones Alami, Ulf Helmersson and J. T. Gudmundsson
  Ion-accoustic solitary waves in a high power pulsed magnetron sputtering discharge
  Journal of Physics D: Applied Physics, 2005, 38(18), 3417-3421.
 Web of Science® Times Cited: 24

Jones Alami, Per O. Å. Persson, Denis Music, J. T. Gudmundsson, Johan Böhlmark and Ulf Helmersson
  Ion-assisted Physical Vapor Deposition for enhanced film properties on non-flat surfaces
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2005, 23(2), 278-280.
 Web of Science® Times Cited: 82

Johan Böhlmark, Jones Alami, Chris Christou, Arutiun P. Ehiasarian and Ulf Helmersson
  Ionization of sputtered metals in high power pulsed magnetron sputtering
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2005, 23(1), 18-22.
 Web of Science® Times Cited: 84

Johan Böhlmark, J. T. Gudmundsson, Jones Alami, Martina Lattemann and Ulf Helmersson
  Spatial electron density distribution in a high-power pulsed magnetron discharge
  IEEE Transactions on Plasma Science, 2005, 33(2), 346-347.
 Web of Science® Times Cited: 52

Johan Böhlmark, Ulf Helmersson, Michael VanZeeland, I. Axnäs, Jones Alami and Nils Brenning
  Measurement of the magnetic field change in a pulsed high current magnetron discharge
  Plasma Sources Science and Technology, 2004, 13(4), 654-661.
 Web of Science® Times Cited: 37

P. Jin, G. Xu, M. Tazawa, K. Yoshimura, Denis Music, Jones Alami and Ulf Helmersson
  Low temperature deposition of a-Al2O3 thin films by sputtering using a Cr2O3 template
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2002, 20(6), 2134-2136.
 Web of Science® Times Cited: 51

J. T. Gudmundsson, Jones Alami and Ulf Helmersson
  Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
  Surface and Coatings Technology, 2002, 161(2-3), 249-256.
 Web of Science® Times Cited: 94

J. T. Gudmundsson, Jones Alami and Ulf Helmersson
  Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
  Applied Physics Letters, 2001, 78(22), 3427.
 Web of Science® Times Cited: 71

Conference Articles

Johan Böhlmark, A.P. Ehiasarian, Martina Lattemann, Jones Alami and Ulf Helmersson
  The Ion Energy Distributions in a High Power Impulse Magnetron Plasma
  48th Annual Technical Conference of the Society of Vacuum Coaters,2005, 2005.


Ulf Helmersson, Martina Lattemann, Jones Alami, Johan Böhlmark, A.P. Ehiasarian and J.T. Gudmundsson
  High Power Impulse Magnetron Sputtering Discharges and Thin Film Growth: A Brief Review
  48th Annual Technical Conference of the Society of Vacuum Coaters,2005, 2005.


Wei-Xin Ni, K. Lyutovich, Jones Alami, Carl Tengstedt, M. Bauer and E. Kasper
  X-ray reciprocal space mapping studies of strain relaxation in thin SiGe layers (=100 nm) using a low temperature growth step
  Journal of Crystal Growth, 2001.


 Web of Science® Times Cited: 20

Ph.D. Theses

Jones Alami
  Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering
  2005.


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