Publications for Jochen Schneider

Publications for Jochen SchneiderCo-author map based on ISI articles 2007-

Journal Articles

Jens Emmerlich, Denis Music, Per Eklund, Ola Wilhelmsson, Ulf Jansson, Jochen M. Schneider, Hans Högberg and Lars Hultman
  Thermal stability of Ti3SiC2 thin films
  Acta Materialia, 2007, 55(4), 1479-1488.
 Web of Science® Times Cited: 77

Denis Music, Valeriu Chirita, Jochen Schneider and Ulf Helmersson
  Effect of chemical composition on the elastic and electrical properties of the boron-oxygen-yttrium system studied by ab initio and experimental means
  Physical Review B. Condensed Matter and Materials Physics, 2004, 69(9), .
 Web of Science® Times Cited: 1

Denis Music, U. Kreissig, Zs. Czigany, Ulf Helmersson and Jochen Schneider
  Elastic modulus-density relationship for amorphous boron suboxide thin films
  Applied Physics A: Materials Science & Processing, 2003, 76(2), 269-271.
 Web of Science® Times Cited: 16

Jochen Schneider, K Larsson, J Lu, E Olsson and B Hjorvarsson
  Role of hydrogen for the elastic properties of alumina thin films
  Applied Physics Letters, 2002, 80(7), 1144-1146.
 Web of Science® Times Cited: 46

Denis Music, Jochen Schneider, Veronika Mozhdeh Kugler, S. Nakao, P. Jin, Mattias Östblom, Lars Hultman and Ulf Helmersson
  Synthesis and mechanical properties of boron suboxide thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2002, 20(2), 335-337.
 Web of Science® Times Cited: 15

Jochen Schneider, A. Anders and G.Yu. Yushkov
  Magnetic-field-dependent plasma composition of a pulsed aluminum arc in an oxygen ambient
  Applied Physics Letters, 2001, 78(2), 150-152.
 Web of Science® Times Cited: 21

Jochen Schneider, A Anders, B Hjorvarsson and Lars Hultman
  Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient
  Applied Physics Letters, 2000, 76(12), 1531-1533.
 Web of Science® Times Cited: 16

Jochen Schneider, S Rohde, WD Sproul and A Matthews
  Recent developments in plasma assisted physical vapour deposition
  Journal of Physics D: Applied Physics, 2000, 33(18), R173-R186.
 Web of Science® Times Cited: 33

K. Macak, V. Kouznetsov, Jochen Schneider, Ulf Helmersson and I. Petrov
  Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2000, 18(4 II), 1533-1537.
 Web of Science® Times Cited: 120