Publications for Jochen Schneider
Co-author map based on ISI articles 2007-
Journal Articles
Jens Emmerlich, Denis Music, Per Eklund, Ola Wilhelmsson, Ulf Jansson, Jochen M. Schneider, Hans Högberg and Lars Hultman
Thermal stability of Ti3SiC2 thin films
Acta Materialia, 2007, 55(4), 1479-1488.
Web of Science® Times Cited: 61 |
Denis Music, Valeriu Chirita, Jochen Schneider and Ulf Helmersson
Effect of chemical composition on the elastic and electrical properties of the boron-oxygen-yttrium system studied by ab initio and experimental means
Physical Review B. Condensed Matter and Materials Physics, 2004, 69(9), .
Web of Science® Times Cited: 1 |
Johanna Rosén, André Anders, Lars Hultman and Jochen Schneider
Charge State and Time-Resolved Plasma Composition ofa Pulsed Zirconium Arc in a Nitrogen Environment
Journal of Applied Physics, 2004, 96, 4793-4799.
Web of Science® Times Cited: 7 |
Denis Music, U. Kreissig, Zs. Czigany, Ulf Helmersson and Jochen Schneider
Elastic modulus-density relationship for amorphous boron suboxide thin films
Applied Physics A, 2003, 76(2), 269-271.
Web of Science® Times Cited: 16 |
Jochen Schneider, K Larsson, J Lu, E Olsson and B Hjorvarsson
Role of hydrogen for the elastic properties of alumina thin films
Applied Physics Letters, 2002, 80(7), 1144-1146.
Web of Science® Times Cited: 41 |
Denis Music, Jochen Schneider, Veronika Mozhdeh Kugler, S. Nakao, P. Jin, Mattias Östblom, Lars Hultman and Ulf Helmersson
Synthesis and mechanical properties of boron suboxide thin films
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2002, 20(2), 335-337.
Web of Science® Times Cited: 14 |
Jochen Schneider, A. Anders and G.Yu. Yushkov
Magnetic-field-dependent plasma composition of a pulsed aluminum arc in an oxygen ambient
Applied Physics Letters, 2001, 78(2), 150-152.
Web of Science® Times Cited: 16 |
Jochen Schneider, A Anders, B Hjorvarsson and Lars Hultman
Magnetic-field-dependent plasma composition of a pulsed arc in a high-vacuum ambient
Applied Physics Letters, 2000, 76(12), 1531-1533.
Web of Science® Times Cited: 16 |
Jochen Schneider, S Rohde, WD Sproul and A Matthews
Recent developments in plasma assisted physical vapour deposition
Journal of Physics D, 2000, 33(18), R173-R186.
Web of Science® Times Cited: 31 |
K. Macak, V. Kouznetsov, Jochen Schneider, Ulf Helmersson and I. Petrov
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2000, 18(4 II), 1533-1537.
Web of Science® Times Cited: 106 |
Ph.D., Lic. Theses
