Publications for Hans Högberg
Co-author map based on ISI articles 2007-
Publications mentioned in social media 4 times*
Journal Articles
Mikhail Chubarov, Henrik Pedersen, Hans Högberg and Anne Henry
¨ of sp(2) hybridized boron nitride thin films
CrysteEngComm, 2013, 15(3), 455-458.
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Esteban Broitman, Andrej Furlan, G. K. Geuorguiev, Zsolt Czigany, Hans Högberg and Lars Hultman
Structural and Mechanical Properties of CNx and CPx Thin Solid Films
Key Engineering Materials, 2012, 488-489, 581-584.
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Mattias Samuelsson, Jens Jensen, Ulf Helmersson, Lars Hultman and Hans Högberg
ZrB2 thin films grown by high power impulse magnetron sputtering (HiPIMS) from a compound target
Thin Solid Films, 2012, 526, 163-167.
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Mattias Samuelsson, Kostas Sarakinos, Hans Högberg, Erik Lewin, Ulf Jansson, Bengt Wälivaara, Henrik Ljungcrantz and Ulf Helmersson
Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions
Surface & Coatings Technology, 2012, 206(8-9), 2396-2402.
Fulltext Web of Science® Times Cited: 2 |
Niklas Gunnarsson Sarius, Jonas Lauridsen, E. Lewin, U. Jansson, Hans Högberg, Å. Öberg, P. Leisner, Per Eklund and Lars Hultman
Contact resistance of Ti-Si-C-Ag and Ti-Si-C-Ag-Pd nanocomposite coatings
Journal of Electronic Materials, 2012, 41(3), 560-567.
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Niklas Gunnarsson Sarius, Jonas Lauridsen, E. Lewin, Jun Lu, Hans Högberg, Å. Öberg, H. Ljungcrantz, P. Leisner, Per Eklund and Lars Hultman
Ni and Ti diffusion barrier layers between Ti-Si-C-Ag nanocomposite coatings and Cu-based substrates
Surface & Coatings Technology, 2012, 206(8-9), 2558-2565.
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Mikhail Chubarov, Henrik Pedersen, Hans Högberg, Jens Jensen and Anne Henry
Growth of High Quality Epitaxial Rhombohedral Boron Nitride
Crystal Growth & Design, 2012, 12(6), 3215-3220.
Web of Science® Times Cited: 1 |
Henrik Pedersen, Mikhail Chubarov, Hans Högberg, Jens Jensen and Anne Henry
On the effect of water and oxygen in chemical vapor deposition of boron nitride
Thin Solid Films, 2012, 520(18), 5889-5893.
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Mihails Cubarovs, Henrik Pedersen, Hans Högberg, Vanya Darakchieva, Jensen Jens, Per Persson and Anne Henry
CVD growth of sp2-hybridized boron nitride using aluminum nitride as buffer layer
Physica Status Solidi. Rapid Research Letters, 2011, 5(10-11), 397-399.
Fulltext Web of Science® Times Cited: 3 |
Jonas Lauridsen, Per Eklund, T. Joelsson, H. Ljungcrantz, Å. Öberg, E. Lewin, U. Jansson, Manfred Beckers, Hans Högberg and Lars Hultman
High-rate deposition of amorphous and nanocomposite Ti-Si-C multifunctional coatings
Surface & Coatings Technology, 2010, 205(2), 299-305.
Fulltext Web of Science® Times Cited: 9 |
A. Oberg, A. Kassman, B. Andre, U. Wiklund, M. Lindquist, E. Lewin, U. Jansson, Hans Högberg, T. Joelsson and H. Ljungcrantz
Conductive nanocomposite ceramics as tribological and electrical contact materials
European Physical Journal, 2010, 49(2), .
Fulltext Web of Science® Times Cited: 5 |
Marie Sonestedt, Jenny Frodelius, Jens-Petter Palmquist, Hans Högberg, Lars Hultman and Krystyna Stiller
Microstructure of high velocity oxy-fuel sprayed Ti2AlC coatings
Journal of Materials Science, 2010, 45(10), 2760-2769.
Web of Science® Times Cited: 5 |
Per Eklund, Manfred Beckers, Ulf Jansson, Hans Högberg and Lars Hultman
The M(n+1)AX(n) phases: Materials science and thin-film processing
Thin Solid Films, 2010, 518(8), 1851-1878.
Fulltext Web of Science® Times Cited: 125 |
Jenny Frodelius, Per Eklund, Manfred Beckers, Per Persson, Hans Högberg and Lars Hultman
Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC
Thin Solid Films, 2010, 518(6), 1621-1626.
Fulltext Web of Science® Times Cited: 15 |
Isabel Van De Keere, Sofia Svedhem, Hans Högberg, Jean Vereecken, Bengt Kasemo and Annick Hubin
In Situ Control of the Oxide Layer on Thermally Evaporated Titanium and Lysozyme Adsorption by Means of Electrochemical Quartz with Dissipation
ACS APPLIED MATERIALS and INTERFACES, 2009, 1(2), 301-310.
Web of Science® Times Cited: 2 |
Galia Pozina, David H. Trinh, Hans Högberg, M. Collin, I. Reineck and Lars Hultman
Phase identification in γ- and κ-alumina coatings by cathodoluminescence
Scripta Materialia, 2009, 61(4), 379-382.
Web of Science® Times Cited: 2 |
David Trinh, K Back, Galia Pozina, H Blomqvist, T Selinder, M Collin, I Reineck, Lars Hultman and Hans Högberg
Phase transformation in kappa- and gamma-Al2O3 coatings on cutting tool inserts
Surface & Coatings Technology, 2009, 203(12), 1682-1688.
Web of Science® Times Cited: 12 |
T.H. Scabarozi, Per Eklund, Jens Emmerlich, Hans Högberg, T. Meehan, P. Finkel, M.W. Barsoum, J.D. Hettinger, Lars Hultman and S.E. Lofland
Weak electronic anisotropy in the layered nanolaminate Ti 2 GeC
Solid State Communications, 2008, 146(11-12), 498-501.
Web of Science® Times Cited: 15 |
O. Wilhelmsson, Per Eklund, Hans Högberg, Lars Hultman and U. Jansson
Structural, electrical and mechanical characterization of magnetron-sputtered V-Ge-C thin films
Acta Materialia, 2008, 56(11), 2563-2569.
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T. Kubart, David Huy Trinh, L. Liljeholm, Lars Hultman, Hans Högberg, T. Nyberg and S. Berg
Experiments and Modelling of Dual Reactive Magnetron Sputtering Using Two Reactive Gases
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2008, 26(4), 565-570.
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David Huy Trinh, T. Kubart, T. Nyberg, M. Ottosson, Lars Hultman and Hans Högberg
DC Magnetron Sputtering Deposition of Nanocomposite Alumina - Zirconia Thin Films
Thin Solid Films, 2008, 516(23), 8352-8358.
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David Huy Trinh, M. Ottosson, M. Collin, I. Reineck, Lars Hultman and Hans Högberg
Nanocomposite Al2O3-ZrO2 thin films grown by reactive dual radio-frequency magnetron sputtering
Thin Solid Films, 2008, 516(15), 4977-4982.
Web of Science® Times Cited: 8 |
Martin Magnuson, Ola Wilhelmsson, Maurizio Mattesini, Sa Li, Rajeev Ahuja, Olle Eriksson, Hans Högberg, Lars Hultman and Ulf Jansson
Anisotropy in the electronic structure of V2GeC investigated by soft x-ray emission spectroscopy and first-principles theory
Physical Review B. Condensed Matter and Materials Physics, 2008, 78(035117), .
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Andrej Furlan, Gueorgui Kostov Gueorguiev, Zsolt Czigány, Hans Högberg, Slawomir Braun, Sven Stafström and Lars Hultman
Synthesis of phosphorus-carbide thin films by magnetron sputtering
physica status solidi (RRL) - Rapid Research Letters, 2008, 2(4), 191-193.
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Jenny Frodelius, Marie Sonestedt, Stefan Björklund, Jens-Petter Palmquist, Krystyna Stiller, Hans Högberg and Lars Hultman
Ti2AlC coatings deposited by High Velocity Oxy-Fuel spraying
Surface and Coatings Technology, 2008, 202(24), 5976-5981.
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Jens Emmerlich, Gert Gassner, Per Eklund, Hans Högberg and Lars Hultman
Micro and macroscale tribological behavior of epitaxial Ti3SiC2 thin films
Wear, 2007, 264(11-12), 914-919.
Web of Science® Times Cited: 13 |
Per Eklund, Jens-Petter Palmquist, Jonas Höwing, David Trinh, Tamer El-Raghy, Hans Högberg and Lars Hultman
Ta4AlC3: Phase determination, polymorphism and deformation
Acta Materialia, 2007, 55(14), 4723-4729.
Web of Science® Times Cited: 40 |
Ola Wilhelmsson, Per Eklund, Finn Giuliani, Hans Högberg, Lars Hultman and Ulf Jansson
Intrusion-type deformation in epitaxial Ti3SiC2/TiCx nanolaminates
Applied Physics Letters, 2007, 91(12), 123124.
Web of Science® Times Cited: 7 |
Per Eklund, Hans Högberg and Lars Hultman
Epitaxial TiC/SiC multilayers
Physica status solidi (RRL): rapid research letters, 2007, 1(3), 113-115.
Web of Science® Times Cited: 7 |
Jens Emmerlich, Denis Music, Per Eklund, Ola Wilhelmsson, Ulf Jansson, Jochen M. Schneider, Hans Högberg and Lars Hultman
Thermal stability of Ti3SiC2 thin films
Acta Materialia, 2007, 55(4), 1479-1488.
Web of Science® Times Cited: 61 |
Jens Emmerlich, Per Eklund, Dirk Rittrich, Hans Högberg and Lars Hultman
Electrical resistivity of Tin+1ACn (A = Si, Ge, Sn, n = 1–3) thin films
Journal of Materials Research, 2007, 22(8), 2279-2287.
Web of Science® Times Cited: 14 |
Per Eklund, Torbjörn Joelsson, Henrik Ljungcrantz, Ola Wilhelmsson, Zsolt Czigany, Hans Högberg and Lars Hultman
Microstructure and electrical properties of Ti-Si-C-Ag nanocomposite thin films
Surface and Coatings Technology, 2007, 201(14), 6465-6469.
Web of Science® Times Cited: 12 |
Per Eklund, Manfred Beckers, Jenny Frodelius, Hans Högberg and Lars Hultman
Magnetron sputtering of Ti3SiC2 thin films from a Ti3SiC2 compound target
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2007, 25(5), 1381-1388.
Web of Science® Times Cited: 21 |
Per Eklund, Anand Murugaiah, Jens Emmerlich, Zsolt Czigany, Jenny Frodelius, Michel W. Barsoum, Hans Högberg and Lars Hultman
Homoepitaxial growth of Ti-Si-C MAX-phase thin films on bulk Ti3SiC2 substrates
Journal of Crystal Growth, 2007, 304(1), 264-269.
Web of Science® Times Cited: 19 |
Jones Alami, Per Eklund, Jens Emmerlich, O. Wilhelmsson, U. Jansson, Hans Högberg, Lars Hultman and Ulf Helmersson
High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target
Thin Solid Films, 2007, 515(4), 1731-1736.
Fulltext Web of Science® Times Cited: 39 |
O. Wilhelmsson, J.-P. Palmquist, E. Lewin, Jens Emmerlich, Per Eklund, Per Persson, Hans Högberg, S. Li, R. Ahuja, O. Eriksson, Lars Hultman and U. Jansson
Deposition and characterization of ternary thin films within the Ti-Al-C system by DC magnetron sputtering
Journal of Crystal Growth, 2006, 291(1), 290-300.
Web of Science® Times Cited: 69 |
Per Eklund, Chariya Virojanadara, Jens Emmerlich, Leif Johansson, Hans Högberg and Lars Hultman
Photoemission studies of Ti3SiC2 and nanocrystalline-TiC/amorphous-SiC nanocomposite thin films
Physical Review B. Condensed Matter and Materials Physics, 2006, 74(4), 045417.
Web of Science® Times Cited: 26 |
Gueorgui Kostov Gueorguiev, Andrej Furlan, Hans Högberg, Sven Stafström and Lars Hultman
First–principles calculations on the structural evolution of solid fullerene–like CPx
Chemical Physics Letters, 2006, 426(4-6), 374-379.
Web of Science® Times Cited: 17 |
Andrej Furlan, Gueorgui Kostov Gueorguiev, Hans Högberg, Sven Stafström and Lars Hultman
Fullerene–like CPx: A first–principles study of the relative stability of precursors and defect energetics during synthetic growth
Thin Solid Films, 2006, 515(3), 1028-1032.
Web of Science® Times Cited: 11 |
David Huy Trinh, Hans Högberg, Jon M. Andersson, M. Collin, I. Reineck, Ulf Helmersson and Lars Hultman
Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2006, 24(2), 309-316.
Web of Science® Times Cited: 12 |
Hans Högberg, Per Eklund, Jens Emmerlich, Jens Birch and Lars Hultman
Epitaxial Ti2GeC, Ti3GeC2, and Ti4GeC3 MAX-phase thin films grown by magnetron sputtering
Journal of Materials Research, 2005, 20(4), 779-782.
Web of Science® Times Cited: 66 |
Jörg Neidhardt, Hans Högberg and Lars Hultman
Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering, Suppression of the chemical desorption processes
Thin Solid Films, 2005, 478(1-2), 34-41.
Web of Science® Times Cited: 9 |
Hans Högberg, Lars Hultman, Jens Emmerlich, Torbjörn Joelsson, Per Eklund, Jon M. Molina-Aldareguia, Jens-Petter Palmquist, Ola Wilhelmsson and Ulf Jansson
Growth and characterization of MAX-phase thin films
Surface & Coatings Technology, 2005, 193(1-3), 6-10.
Web of Science® Times Cited: 79 |
Per Eklund, Jens Emmerlich, Hans Högberg, Ola Wilhelmsson, Peter Isberg, Jens Birch, Per O. Å. Persson, Ulf Jansson and Lars Hultman
Structural, electrical, and mechanical properties of nc-TiC/a-SiC nanocomposite thin films
Journal of Vacuum Science & Technology B, 2005, 23(6), 2486-2495.
Web of Science® Times Cited: 36 |
Martin Magnuson, Jens-Petter Palmquist, M. Mattesini, Sa Li, Rajeev Ahuja, Olle Eriksson, Jens Emmerlich, Ola Wilhelmsson, Per Eklund, Hans Högberg, Lars Hultman and Ulf Jansson
Electronic structure investigation of Ti3AlC2 , Ti3SiC2 , and Ti3GeC2 by soft x-ray emission spectroscopy
Physical Review B. Condensed Matter and Materials Physics, 2005, 72(24), .
Fulltext Web of Science® Times Cited: 24 |
Jörg Neidhardt, Hans Högberg and Lars Hultman
Arrhenius-type temperature dependence of the chemical desorption processes active during deposition of fullerene-like carbon nitride thin films
Surface Science, 2004, 569( 1-3), .
Web of Science® Times Cited: 2 |
Jens Emmerlich, Hans Högberg, Szilvia Sasvári, Per Persson, Lars Hultman, Jens-Petter Palmquist, Ulf Jansson, Jon M. Molina-Aldareguia and Zsolt Czigány
Growth of Ti3SiC2 thin films by elemental target magnetron sputtering
Journal of Applied Physics, 2004, 96(9), 4817-4826.
Web of Science® Times Cited: 83 |
Jens-Petter Palmquist, Sa Li, Per Persson, Jens Emmerlich, Ola Wilhelmsson, Hans Högberg, M. I. Katsnelson, Börje Johansson, Rajeev Ahuja, Olle Eriksson, Lars Hultman and Ulf Jansson
Mn+1AXn phases in the Ti-Si-C system studied by thin-film synthesis and ab initio calculations
Physical Review B. Condensed Matter and Materials Physics, 2004, 70(16), 165401.
Web of Science® Times Cited: 104 |
Per Eklund, Jens-Petter Palmquist, Ola Wilhelmsson, Ulf Jansson, Jens Emmerlich, Hans Högberg and Lars Hultman
Comment on "Pulsed laser deposition and properties of Mn+1AXx phase formulated Ti3SiC2 thin films"
Tribology letters, 2004, 17(4), 977-978.
Web of Science® Times Cited: 6 |
H.W. Hugosson, Hans Högberg, M. Algren, M. Rodmar and T.I. Selinder
Theory of the effects of substitutions on the phase stabilities of Ti1-xAlxN
Journal of Applied Physics, 2003, 93(8), 4505-4511.
Web of Science® Times Cited: 42 |
L. Landstrlom, Zs. Marton, N. Arnold, Hans Högberg, M. Boman and P. Heszler
In situ monitoring of size distributions and characterization of nanoparticles during W ablation in N2 atmosphere
Journal of Applied Physics, 2003, 94(3), 2011-2017.
Web of Science® Times Cited: 9 |
J. Sundqvist, H. Hogberg and A. Harsta
Atomic layer deposition of Ta2O5 using the TaI 5 and O2 precursor combination
Chemical Vapor Deposition, 2003, 9(5), 245-248.
Web of Science® Times Cited: 11 |
Hans Högberg, Jens Birch, MP Johansson, Lars Hultman and U Jansson
Deposition of epitaxial transition metal carbide films and superlattices by simultaneous direct current metal magnetron sputtering and C-60 evaporation
Journal of Materials Research, 2001, 16(3), 633-643.
Web of Science® Times Cited: 10 |
Conference Articles
Hans Högberg, Jens Emmerlich, Per Eklund, Ola Wilhelmsson, Jens-Petter Palmquist, Ulf Jansson and Lars Hultman
Growth and characterization of epitaxial MAX-phase thin films from the Tin+1(Si,Ge,Sn)Cn systems
11th International Ceramics Congress, CIMTEC,2006, 2006.
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Per Eklund, Jens Emmerlich, Hans Högberg, Lars Hultman, Ola Wilhelmsson, Ulf Jansson and Peter Isberg
Synthesis and characterization of Ti-Si-C compounds for electrical contact applications
IEEE Holm Conference on Electrical Contacts,2005, 2005.
Web of Science® Times Cited: 5
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Ph.D. Theses
Licentiate Theses
* Social media data based on publications from 2011 to present and with a DOI; data delivered by Altmetric.com.
Ph.D., Lic. Theses
