Publications for Grzegorz Greczynski
Co-author map based on ISI articles 2007-

Keywords

sputtering spectroscopy reactive pulsed power plasma microstructure microscopy magnetron ions ion hipims hardness gpa gas flux film energy cr composition

Journal Articles

Jianqiang Zhu, Mats Johansson Jöesaar, Peter Polcik, Jens Jensen, Grzegorz Greczynski, Lars Hultman and Magnus Odén
  Influence of Ti-Si cathode grain size on the cathodic arc process and resulting Ti-Si-N coatings
  Surface & Coatings Technology, 2013, 235(25), 637-647.

Susann Schmidt, Zsolt Czigany, Grzegorz Greczynski, Jens Jensen and Lars Hultman
  Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin films
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2013, 31(1), 011503.
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 Web of Science® Times Cited: 1

V. Zavaleyev, J. Walkowicz, Grzegorz Greczynski and Lars Hultman
  Effect of substrate temperature on properties of diamond-like films deposited by combined DC impulse vacuum-arc method
  Surface & Coatings Technology, 2013, 236, 444-449.

Susann Schmidt, Cecilia Goyenola, Gueorgui Kostov Gueorguiev, Jens Jensen, Grzegorz Greczynski, Ivan Gueorguiev Ivanov, Zs Czigany and Lars Hultman
  Reactive high power impulse magnetron sputtering of CFx thin films in mixed Ar/C4F4 and Ar/C4F8 discharges
  Thin Solid Films, 2013, 542, 21-30.

Grzegorz Greczynski, Jun Lu, Jens Jensen, Ivan Petrov, Joseph E. Greene, Stephan Bolz, Werner Koelker, Christoph Schiffers, Oliver Lemmer and Lars Hultman
  Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate bias
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(6), .
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 Web of Science® Times Cited: 1

Ali Khatibi, J. Sjolen, Grzegorz Greczynski, Jens Jensen, Per Eklund and Lars Hultman
  Structural and mechanical properties of Cr-Al-O-N thin films grown by cathodic arc deposition
  Acta Materialia, 2012, 60(19), 6494-6507.
 Web of Science® Times Cited: 8

Susann Schmidt, Zs Czigany, Grzegorz Greczynski, Jens Jensen and Lars Hultman
  Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N-2
  Journal of Applied Physics, 2012, 112(1), 013305.
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 Web of Science® Times Cited: 4

Grzegorz Greczynski, Jun Lu, M.P. Johansson, Jens Jensen, Ivan Petrov, Joseph E Greene and Lars Hultman
  Role of Tin+ and Aln+ ion irradiation (n=1, 2) during Ti1-xAlxN alloy film growth in a hybrid HIPIMS/magnetron mode
  Surface & Coatings Technology, 2012, 206(19-20), 4202-4211.
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 Web of Science® Times Cited: 5

Grzegorz Greczynski, Jun Lu, M Johansson, Jens Jensen, Ivan Petrov, Joseph E Greene and Lars Hultman
  Selection of metal ion irradiation for controlling Ti1-xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputtering
  Vacuum, 2012, 86(8), 1036-1040.
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 Web of Science® Times Cited: 7

Susann Schmidt, Grzegorz Greczynski, Cecilia Goyenola, Gueorgui Kostov Gueorguiev, Zs Czigany, Jens Jensen, Ivan Gueorguiev Ivanov and Lars Hultman
  CF(x) thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization
  Surface & Coatings Technology, 2011, 206(4), 646-653.
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 Web of Science® Times Cited: 3

Grzegorz Greczynski, Jens Jensen and Lars Hultman
  Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
  Thin Solid Films, 2011, 519(19), 6354-6361.
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 Web of Science® Times Cited: 6

Jianqiang Zhu, Anders O. Eriksson, Naureen Ghafoor, Grzegorz Greczynski, Lars Hultman, Johanna Rosén and Magnus Odén
  Microstructure evolution of Ti3SiC2 compound cathodes during reactive cathodic arc evaporation
  Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2011, 29(3), 031601.
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Anders Eriksson, Jianqiang Zhu, Naureen Ghafoor, Jens Jensen, Grzegorz Greczynski, Mats Johansson, Jacob Sjölen, Magnus Odén, Lars Hultman and Johanna Rosén
  Ti-Si-C-N Thin Films Grown by Reactive Arc Evaporation from Ti3SiC2 Cathodes
  Journal of Materials Research, 2011, 26, 874-881.
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 Web of Science® Times Cited: 7

Grzegorz Greczynski, Jens Jensen and Lars Hultman
  CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
  IEEE TRANSACTIONS ON PLASMA SCIENCE, 2010, 38(11), 3046-3056.
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 Web of Science® Times Cited: 7

Grzegorz Greczynski, Jens Jensen, J Bohlmark and Lars Hultman
  Microstructure control of CrNx films during high power impulse magnetron sputtering
  SURFACE and COATINGS TECHNOLOGY, 2010, 205(1), 118-130.
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 Web of Science® Times Cited: 11

Esteban Broitman, Zs. Czigany, Grzegorz Greczynski, J. Bohlmark, R. Cremer and Lars Hultman
  Industrial-scale deposition of highly adherent CNx films on steel substrates
  Surface & Coatings Technology, 2010, 204(21-22), 3349-3357.
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 Web of Science® Times Cited: 7

Grzegorz Greczynski and Lars Hultman
  Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N-2 atmospheres
  VACUUM, 2010, 84(9), 1159-1170.
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 Web of Science® Times Cited: 19

Stina Jönsson, J. Birgerson, Xavier Crispin, Grzegorz Greczynski, Wojciech Osikowicz, A.W. Denier van der Gon, William R Salaneck and Mats Fahlman
  The effects of solvents on the morphology and sheet resistance in poly(3,4-ethylenedioxythiophene)–polystyrenesulfonic acid (PEDOT–PSS) films
  Synthetic metals, 2003, 139(1), 1-10.
 Web of Science® Times Cited: 288

Ph.D. Theses

Susann Schmidt
  Carbon Nitride and Carbon Fluoride Thin Films Prepared by HiPIMS
  2013.


  Fulltext PDF

Licentiate Theses

Susann Schmidt
  Carbon based Thin Films Prepared by HiPIMS and DCMS
  2012.