Publications for Erik Wallin
Co-author map based on ISI articles 2007-

Keywords

water temperatures sputtering residual reactive power partial nucleation magnetron impulse hipims gas film energy deposited crystalline coatings alumina alpha-alumina al

Journal Articles

Daniel Lundin, Nils Brenning, Daniel Jädernäs, Petter Larsson, Erik Wallin, Martina Lattemann, Michael A Raadu and Ulf Helmersson
  Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
  PLASMA SOURCES SCIENCE and TECHNOLOGY, 2009, 18(4), 045008.
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 Web of Science® Times Cited: 30

Erik Wallin, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Low-temperature alpha-alumina thin film growth: ab initio studies of Al adatom surface migration
  JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42(12), 125302.
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 Web of Science® Times Cited: 6

T.I. Selinder, E. Coronel, Erik Wallin and Ulf Helmersson
  α-alumina coatings on WC/Co substrates by physical vapor deposition
  International journal of refractory metals & hard materials, 2009, 27(2), 507-512.
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 Web of Science® Times Cited: 12

Erik Wallin and Ulf Helmersson
  Hysteresis-free reactive high power impulse magnetron sputtering
  Thin Solid Films, 2008, 516(18), 6398-6401.
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 Web of Science® Times Cited: 37

Daniel Lundin, Petter Larsson, Erik Wallin, Martina Lattemann, Nils Brenning and Ulf Helmersson
  Cross-field ion transport during high power impulse magnetron sputtering
  Plasma Sources Science and Technology, 2008, 17(035021), .
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 Web of Science® Times Cited: 57

Erik Wallin, Jon Martin Andersson, Martina Lattemann and Ulf Helmersson
  Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films
  Thin Solid Films, 2008, 516(12), 3877-3883.
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 Web of Science® Times Cited: 16

Erik Wallin, T. I. Selinder, M. Elfwing and Ulf Helmersson
  Synthesis of α-Al2O3 thin films using reactive high power impulse magnetron sputtering
  Europhysics letters, 2008, 82(3), 36002.
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 Web of Science® Times Cited: 30

Jones Alami, Per Eklund, Jon M. Andersson, Martina Lattemann, Erik Wallin, Johan Böhlmark, Per Persson and Ulf Helmersson
  Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
  Thin Solid Films, 2007, 515(7-8), 3434-3438.
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 Web of Science® Times Cited: 40

Jon Martin Andersson, Erik Wallin, Ulf Helmersson, U. Kreissig and E. Peter Münger
  Phase control of Al2O3 thin films grown at low temperatures
  Thin Solid Films, 2006, 513(1-2), 57-59.
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 Web of Science® Times Cited: 43

Jon M. Andersson, Erik Wallin, E. Peter Münger and Ulf Helmersson
  Molecular content of the deposition flux during reactive Ar/O2 magnetron sputtering of Al
  Applied Physics Letters, 2006, 88(05), Art. No. 054101 JAN 30 2006.
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 Web of Science® Times Cited: 7

Jon M. Andersson, Erik Wallin, Peter Münger and Ulf Helmersson
  Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures
  Journal of Applied Physics, 2006, 100(3), Art. No. 033305 AUG 1 2006.
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 Web of Science® Times Cited: 20

Jon M. Andersson, Erik Wallin, Valeriu Chirita, E. Peter Münger and Ulf Helmersson
  Ab initio calculations on the effects of additives on alumina phase stability
  Physical review. B, Condensed matter and materials physics, 2005, 71(014101), 014101.
 Web of Science® Times Cited: 11

Erik Wallin, Jon M. Andersson, Valeriu Chirita and Ulf Helmersson
  Effects of additives in α- and θ-alumina: an ab initio study
  Journal of Physics: Condensed Matter, 2004, 16(49), 8971-8980.
 Web of Science® Times Cited: 12

Conference Articles

Erik Wallin
  Deposition of Metal Oxide Coatings using Reactive High Power Impulse Magnetron Sputtering
  AVS 55th International Symposium,2008, 2008.


Erik Wallin
  Deposition of Crystalline Alumina Coatings using Reactive High Power Impulse Magnetron Sputtering - Process and Film Properties
  The 11:th International Conference on Plasma Surface Engineering,2008, 2008.


Erik Wallin
  Low-temperature Hysteresis-free Reactive Deposition of Alpha-alumina
  51st SVC Annual Technical Conference,2008, 2008.


Ulf Helmersson, Erik Wallin and Martina Lattemann
  Hysteresis-free reactive deposi-tion of alpha-Al2O3 using high HIPIMS
  HIPIMS ABS-Days Conference,2007, 2007.


Erik Wallin
  Deposition of crystalline alumina by reactive high power impulse magnetron sputtering
  Symposium on Ionized Physical Vapor Deposition,2007, 2007.


Erik Wallin, S Svedin, Martina Lattemann and Ulf Helmersson
  Deposition of crystalline alumina by reactive high power impulse magnetron sputtering
  International Vacuum Congress,2007, 2007.


Martina Lattemann, Erik Wallin and Ulf Helmersson
  Microstructure evolution in high power impulse magnetron sputtering deposited titanium nitride
  AVS 54th International Symposium,2007, 2007.


Ulf Helmersson, Erik Wallin and Martina Lattemann
  Reactive High Power Impulse Magnetron Sputter Deposition of Alumina
  AVS 54th International Symposium,2007, 2007.


Erik Wallin and Ulf Helmersson
  Hysteresis-free reactive high power impulse magnetron sputtering
  The Symposium on Reactive Sputter Deposition,2007, 2007.


Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  AVS 54th International Symposium,2007, 2007.


Erik Wallin, Jon Andersson, Peter Münger, Valeriu Chirita and Ulf Helmersson
  Ab initio studies of adsorption and diffusion processes on alpha-Al2O3 (0001) surfaces
  International Symposium on Reactive Sputter Deposition,2007, 2007.


Ph.D. Theses

Erik Wallin
  Alumina Thin Films: From Computer Calculations to Cutting Tools
  2008.


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Licentiate Theses

Erik Wallin
  Alumina Thin Film Growth: Experiments and Modeling
  2007.


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