Publications for Daniel Lundin
Co-author map based on ISI articles 2007-
Publications mentioned in social media 3 times*
Journal Articles
Montri Aiempanakit, Asim Aijaz, Daniel Lundin, Ulf Helmersson and Tomas Kubart
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
Journal of Applied Physics, 2013, 113(13), .
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Chunqing Huo, Michael A Raadu, Daniel Lundin, Jon Tomas Gudmundsson, Andre Anders and Nils Brenning
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses
Plasma sources science & technology (Print), 2012, 21(4), 045004.
Web of Science® Times Cited: 4 |
Henrik Pedersen, Petter Larsson, Asim Aijaz, Jens Jensen and Daniel Lundin
A novel high-power pulse PECVD method
Surface & Coatings Technology, 2012, 206(22), 4562-4566.
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Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Bjorefors, Bengt Walivaara, Henrik Ljungcrantz and Ulf Helmersson
Influence of ionization degree on film properties when using high power impulse magnetron sputtering
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(3), 031507.
Fulltext Web of Science® Times Cited: 2 |
Daniel Lundin and Kostas Sarakinos
An introduction to thin film processing using high-power impulse magnetron sputtering
Journal of Materials Research, 2012, 27(5), 780-792.
Fulltext Web of Science® Times Cited: 13 |
N Brenning, C Huo, Daniel Lundin, M A Raadu, C Vitelaru, G D Stancu, T Minea and Ulf Helmersson
Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields
Plasma sources science & technology (Print), 2012, 21(2), 025005.
Fulltext Web of Science® Times Cited: 9 |
C Vitelaru, Daniel Lundin, G D Stancu, N Brenning, J Bretagne and T Minea
Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics
Plasma sources science & technology (Print), 2012, 21(2), 025010.
Fulltext Web of Science® Times Cited: 4 |
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson
High power impulse magnetron sputtering discharge
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(030801), .
Fulltext Web of Science® Times Cited: 25 |
Asim Aijaz, Kostas Sarakinos, Daniel Lundin, Nils Brenning and Ulf Helmersson
A strategy for increased carbon ionization in magnetron sputtering discharges
Diamond and related materials, 2012, 23, 1-4.
Fulltext Web of Science® Times Cited: 5 |
Daniel Lundin, Seham Al Sahab, Nils Brenning, Chunqing Huo and Ulf Helmersson
Internal current measurements in high power impulse magnetron sputtering
Plasma sources science & technology (Print), 2011, 20(4), 045003.
Fulltext Web of Science® Times Cited: 6 |
Junaid Muhammad, Daniel Lundin, Justinas Palisaitis, Ching-Lien Hsiao, Vanya Darakchieva, Jens Jensen, Per Persson, Per Sandström, W-J Lai, L-C Chen, K-H Chen, Ulf Helmersson, Lars Hultman and Jens Birch
Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering
Journal of Applied Physics, 2011, 110(12), 123519.
Fulltext Web of Science® Times Cited: 4 |
Mattias Samuelsson, Daniel Lundin, Jens Jensen, Michael A Raadu, Jon Tomas Gudmundsson and Ulf Helmersson
On the film density using high power impulse magnetron sputtering
Surface & Coatings Technology, 2010, 205(2), 591-596.
Fulltext Web of Science® Times Cited: 29 |
Asim Aijaz, Daniel Lundin, Petter Larsson and Ulf Helmersson
Dual-magnetron open field sputtering system for sideways deposition of thin films
SURFACE and COATINGS TECHNOLOGY, 2010, 204(14), 2165-2169.
Fulltext Web of Science® Times Cited: 8 |
N Brenning, R L Merlino, Daniel Lundin, M A Raadu and Ulf Helmersson
Faster-than-Bohm Cross-B Electron Transport in Strongly Pulsed Plasmas
PHYSICAL REVIEW LETTERS, 2009, 103(22), .
Fulltext Web of Science® Times Cited: 14 |
Daniel Lundin, Nils Brenning, Daniel Jädernäs, Petter Larsson, Erik Wallin, Martina Lattemann, Michael A Raadu and Ulf Helmersson
Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering
PLASMA SOURCES SCIENCE and TECHNOLOGY, 2009, 18(4), 045008.
Fulltext Web of Science® Times Cited: 20 |
Daniel Lundin, Marc Stahl, Holger Kersten and Ulf Helmersson
Energy flux measurements in high power impulse magnetron sputtering
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42(18), 185202.
Fulltext Web of Science® Times Cited: 18 |
J T Gudmundsson, P. Sigurjonsson, Petter Larsson, Daniel Lundin and Ulf Helmersson
On the electron energy in the high power impulse magnetron sputtering discharge
JOURNAL OF APPLIED PHYSICS, 2009, 105(12), .
Fulltext Web of Science® Times Cited: 23 |
Daniel Lundin, Petter Larsson, Erik Wallin, Martina Lattemann, Nils Brenning and Ulf Helmersson
Cross-field ion transport during high power impulse magnetron sputtering
Plasma Sources Science and Technology, 2008, 17(035021), .
Fulltext Web of Science® Times Cited: 44 |
Daniel Lundin, Ulf Helmersson, Scott Kirkpatrick, Suzanne Rohde and Nils Brenning
Anomalous electron transport in high power impulse magnetron sputtering
Plasma Sources Science and Technology, 2008, 17(2), 025007.
Fulltext Web of Science® Times Cited: 31 |
Nils Brenning, I Axnas, M. A. Raadu, Daniel Lundin and Ulf Helmersson
A bulk plasma model for dc and HiPIMS magnetrons
PLASMA SOURCES SCIENCE and TECHNOLOGY, 2008, 17(4), 045009.
Fulltext Web of Science® Times Cited: 22 |
Conference Articles
Montri Aiempanakit, Daniel Lundin, Petter Larsson, Daniel Jädernäs and Ulf Helmersson
Effects on deposition rate when varying the magnetic field strength in magnetron sputtering
14th International Congress on Thin Films,2008, 2008.
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Daniel Lundin
Effect on Thin Film Growth due to Anomalous Transport in High Power Impulse Magnetron Sputtering
AVS 55:th International Symposium,2008, 2008.
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Daniel Lundin
Cross-field ion Transport in High Power impulse Magnetron Sputtering and its Effect on Deposition Rates
The 11:th International Conference on Plasma Surface Engineering,2008, 2008.
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Daniel Lundin
Cross-field Ion Transport in High Power Impulse Magnetron Sputtering and it's Effect on Deposition Rates
HIPIMS Days,2008, 2008.
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Pall Sigurjonsson, Daniel Lundin, Jon Tomas Gudmundsson and Ulf Helmersson
Electron energy in high power impulse magnetron sputtering (HiPIMS) discharge
Symposium on Ionized Physical Vapor Deposition,2007, 2007.
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Daniel Lundin, Scott Kirkpatrick, Nils Brenning and Ulf Helmersson
Anomalous electron transport in high power impulse magnetron sputtering plasmas
International Vacuum Congress,2007, 2007.
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Nils Brenning, Daniel Lundin, Scott Kirkpatrick and Ulf Helmersson
Anomalous transport through lower-hybrid waves in a HIPIMS sputtering magnetron
International Vacuum Congress,2007, 2007.
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Pall Sigurjonsson, Daniel Lundin, Ulf Helmersson and Jon Tomas Gudmundsson
The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS)
60th Gaseous Electronics Conference,2007, 2007.
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Ph.D. Theses
Licentiate Theses
* Social media data based on publications from 2011 to present and with a DOI; data delivered by Altmetric.com.
Ph.D., Lic. Theses
