Montri Aiempanakit, Asim Aijaz, Daniel Lundin, Ulf Helmersson and Tomas Kubart Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides Journal of Applied Physics, 2013, 113(13), .
Web of Science® Times Cited: 41 | |
Henrik Pedersen, Petter Larsson, Asim Aijaz, Jens Jensen and Daniel Lundin A novel high-power pulse PECVD method Surface & Coatings Technology, 2012, 206(22), 4562-4566.
Fulltext Web of Science® Times Cited: 15 | |
Asim Aijaz, Kostas Sarakinos, Daniel Lundin, Nils Brenning and Ulf Helmersson A strategy for increased carbon ionization in magnetron sputtering discharges Diamond and related materials, 2012, 23, 1-4.
Fulltext Web of Science® Times Cited: 41 | |
Daniel Lundin and Kostas Sarakinos An introduction to thin film processing using high-power impulse magnetron sputtering Journal of Materials Research, 2012, 27(5), 780-792.
Fulltext Web of Science® Times Cited: 126 | |
C Vitelaru, Daniel Lundin, G D Stancu, N Brenning, J Bretagne and T Minea Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics Plasma sources science & technology (Print), 2012, 21(2), 025010.
Fulltext Web of Science® Times Cited: 44 | |
Chunqing Huo, Michael A Raadu, Daniel Lundin, Jon Tomas Gudmundsson, Andre Anders and Nils Brenning Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses Plasma sources science & technology (Print), 2012, 21(4), 045004.
Web of Science® Times Cited: 47 | |
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson High power impulse magnetron sputtering discharge Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(030801), .
Fulltext Web of Science® Times Cited: 219 | |
Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Bjorefors, Bengt Walivaara, Henrik Ljungcrantz and Ulf Helmersson Influence of ionization degree on film properties when using high power impulse magnetron sputtering Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30(3), 031507.
Fulltext Web of Science® Times Cited: 11 | |
N Brenning, C Huo, Daniel Lundin, M A Raadu, C Vitelaru, G D Stancu, T Minea and Ulf Helmersson Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields Plasma sources science & technology (Print), 2012, 21(2), 025005.
Fulltext Web of Science® Times Cited: 38 | |
Daniel Lundin, Seham Al Sahab, Nils Brenning, Chunqing Huo and Ulf Helmersson Internal current measurements in high power impulse magnetron sputtering Plasma sources science & technology (Print), 2011, 20(4), 045003.
Fulltext Web of Science® Times Cited: 25 | |
Junaid Muhammad, Daniel Lundin, Justinas Palisaitis, Ching-Lien Hsiao, Vanya Darakchieva, Jens Jensen, Per Persson, Per Sandström, W-J Lai, L-C Chen, K-H Chen, Ulf Helmersson, Lars Hultman and Jens Birch Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering Journal of Applied Physics, 2011, 110(12), 123519.
Fulltext Web of Science® Times Cited: 10 | |
Asim Aijaz, Daniel Lundin, Petter Larsson and Ulf Helmersson Dual-magnetron open field sputtering system for sideways deposition of thin films SURFACE and COATINGS TECHNOLOGY, 2010, 204(14), 2165-2169.
Fulltext Web of Science® Times Cited: 12 | |
Mattias Samuelsson, Daniel Lundin, Jens Jensen, Michael A Raadu, Jon Tomas Gudmundsson and Ulf Helmersson On the film density using high power impulse magnetron sputtering Surface & Coatings Technology, 2010, 205(2), 591-596.
Fulltext Web of Science® Times Cited: 124 | |
Daniel Lundin, Marc Stahl, Holger Kersten and Ulf Helmersson Energy flux measurements in high power impulse magnetron sputtering JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42(18), 185202.
Fulltext Web of Science® Times Cited: 35 | |
N Brenning, R L Merlino, Daniel Lundin, M A Raadu and Ulf Helmersson Faster-than-Bohm Cross-B Electron Transport in Strongly Pulsed Plasmas PHYSICAL REVIEW LETTERS, 2009, 103(22), .
Fulltext Web of Science® Times Cited: 36 | |
J T Gudmundsson, P. Sigurjonsson, Petter Larsson, Daniel Lundin and Ulf Helmersson On the electron energy in the high power impulse magnetron sputtering discharge JOURNAL OF APPLIED PHYSICS, 2009, 105(12), .
Fulltext Web of Science® Times Cited: 43 | |
Daniel Lundin, Nils Brenning, Daniel Jädernäs, Petter Larsson, Erik Wallin, Martina Lattemann, Michael A Raadu and Ulf Helmersson Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering PLASMA SOURCES SCIENCE and TECHNOLOGY, 2009, 18(4), 045008.
Fulltext Web of Science® Times Cited: 55 | |
Nils Brenning, I Axnas, M. A. Raadu, Daniel Lundin and Ulf Helmersson A bulk plasma model for dc and HiPIMS magnetrons PLASMA SOURCES SCIENCE and TECHNOLOGY, 2008, 17(4), 045009.
Fulltext Web of Science® Times Cited: 32 | |
Daniel Lundin, Ulf Helmersson, Scott Kirkpatrick, Suzanne Rohde and Nils Brenning Anomalous electron transport in high power impulse magnetron sputtering Plasma Sources Science and Technology, 2008, 17(2), 025007.
Fulltext Web of Science® Times Cited: 51 | |
Daniel Lundin, Petter Larsson, Erik Wallin, Martina Lattemann, Nils Brenning and Ulf Helmersson Cross-field ion transport during high power impulse magnetron sputtering Plasma Sources Science and Technology, 2008, 17(035021), .
Fulltext Web of Science® Times Cited: 95 | |
Daniel Lundin and Henrik Pedersen High power pulsed plasma enhanced chemical vapor deposition: a brief overview of general concepts and early results NINETEENTH EUROPEAN CONFERENCE ON CHEMICAL VAPOR DEPOSITION (EUROCVD 19), 2013. Web of Science® Times Cited: 8
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M. Stahl, H. Kersten, Daniel Lundin and Ulf Helmersson Energy influx measurements in HiPIMS plasmas 36th EPS Conference on Plasma Physics 2009, EPS 2009 - Europhysics Conference Abstracts, vol 33 E1, 2009.
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Daniel Lundin Cross-field ion Transport in High Power impulse Magnetron Sputtering and its Effect on Deposition Rates The 11:th International Conference on Plasma Surface Engineering,2008, 2008.
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Daniel Lundin Cross-field Ion Transport in High Power Impulse Magnetron Sputtering and it's Effect on Deposition Rates HIPIMS Days,2008, 2008.
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Daniel Lundin Effect on Thin Film Growth due to Anomalous Transport in High Power Impulse Magnetron Sputtering AVS 55:th International Symposium,2008, 2008.
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Montri Aiempanakit, Daniel Lundin, Petter Larsson, Daniel Jädernäs and Ulf Helmersson Effects on deposition rate when varying the magnetic field strength in magnetron sputtering 14th International Congress on Thin Films,2008, 2008.
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Daniel Lundin, Scott Kirkpatrick, Nils Brenning and Ulf Helmersson Anomalous electron transport in high power impulse magnetron sputtering plasmas International Vacuum Congress,2007, 2007.
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Nils Brenning, Daniel Lundin, Scott Kirkpatrick and Ulf Helmersson Anomalous transport through lower-hybrid waves in a HIPIMS sputtering magnetron International Vacuum Congress,2007, 2007.
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Pall Sigurjonsson, Daniel Lundin, Jon Tomas Gudmundsson and Ulf Helmersson Electron energy in high power impulse magnetron sputtering (HiPIMS) discharge Symposium on Ionized Physical Vapor Deposition,2007, 2007.
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Pall Sigurjonsson, Daniel Lundin, Ulf Helmersson and Jon Tomas Gudmundsson The plasma parameters in a high power impulse magnetron sputtering discharge (HiPIMS) 60th Gaseous Electronics Conference,2007, 2007.
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